介绍了一种适用于高温超导带材的电化学抛光液,其配方为:浓硫酸24.8%(质量分数,下同),浓磷酸71.6%,甘油0.1% ~5.0%,柠檬酸铵0.05% ~ 0.20%,一水合柠檬酸0.1% ~ 5.0%,氟硼酸0.05% ~ 0.20%,二乙烯三胺五乙酸(DTPA)0.002% ~ 0.010%,硫酸铵0.1% ~ 5.0%,水1% ~ 5%.采用激光检测系统、金相显微镜、原子力显微镜和扫描电镜表征了采用该抛光液对哈氏合金基带的抛光效果.自制抛光液的稳定性和抛光效果略优于市售EP2500抛光液,但成本更低.%An electrochemical polishing solution suitable for high-temperature superconductive strip comprising concentrated sulfuric acid 24.8wt.%, concentrated phosphoric acid 71.6wt.%, glycerol 0.1wt.%-5.0wt.%, ammonium citrate 0.05wt.%-0.20wt.%, citric acid monohydrate 0.1wt.%-5.0wt.%, fluoroboric acid 0.05wt.%-0.20wt.%, diethylenetriamine-pentaacetic acid (DTPA) 0.002wt.%-0.010wt.%, ammonium sulfate 0.1wt.%-5.0wt.%, and water 1wt.%-5wt.% was introduced. The polishing effectiveness of the polishing solution on Hastelloy alloy strip was characterized using laser detection system, metallographic microscope, atomic force microscope, and scanning electron microscope. The home-made polishing solution has slightly better stability and polishing effectiveness with a far lower cost as compared with the commercial EP2500 polishing solution.
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