首页> 中文期刊> 《稀有金属材料与工程》 >Fabrication and Gas Response Characteristics of Metal Semiconductor Nanostructures Grown by Ambient Pressure

Fabrication and Gas Response Characteristics of Metal Semiconductor Nanostructures Grown by Ambient Pressure

         

摘要

SnO_2 nanowires and ZnO nanorods were grown on the surface of thin film by heat treatment of mental Sn and Zn under Ar gas flow and O_2 atmospheric pressure.The sensitivity of the SnO_2 thin film device on which grown nanowires to CO gas(concentration of 5000μg/g)was 50% at the operating temperature of 200℃.In case of using Pt as catalysts,the sensitivity was enhanced and operating temperature was reduced(sensitivity of 70% at the operating temperature of 150℃). The sensitivity of the ZnO nanorods device using Cu as catalysts to NO_x gas was 90% at the operating temperature of 200℃.It was found that the sensitivity to CO and NO_x gases for the device on which grown nanostructures was much higher than those for general thin films devices.

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