Molecular Dynamics Simulation of Zero-Fluence and Low-Bombarding-Energy ^(63)Cu-^(65)Cu Sputtering

摘要

A molecuIar dynamics simulation has been used to study zero-fluence and low- bombarding63Cu-65Cu sputtering. Calculations show that the isotopic ratios at both θ≤35° and energy 63Cu-65Cu sputtering. Calculations show that the isotopic ratios at both θ≤35° and θ >35°, and the total isotopic ratio increase when the bombarding energy decreases. This result might impty the existence of the bombarding-energy-dependent momentum asymmetry.