Fabrication and measurement of high-g MEMS accelerometer

摘要

A high-g beam-mass structure accelerometer was designed.In this structure,by means of KOH back etching on the mass,V-groove structure was fabricated on the backside of the mass,so the weight of the mass and also the relative distance between the mass center and the neutral plane were all decreased.With the thin mass structure,we can take advantage of both beam-mass structure and flat film structure;the fabrication process is also simple.By means of Hopkinson shock test system,we did the accelerometer calibration.According to the test result,the sensitivity of the MEMS accelerometer is 0.71 μV/g,which keeps in accordance with the theoretical calculation.After a 200 000 g shocking test,the micro structure worked as usual,so this design can satisfy the requirements of high shock,seriously vibration test environment.