Acousto-optic scanning spatial-switching multiphoton lithography

摘要

Nano-3D printing has obtained widespread attention owing to its capacity to manufacture end-use components with nano-scale features in recent years.Multiphoton lithography(MPL)is one of the most promising 3D nanomanufacturing technologies,which has been widely used in manufacturing micro-optics,photonic crystals,microfluidics,meta-surface,and mechanical metamaterials.Despite of tremendous potential of MPL in laboratorial and industrial applications,simultaneous achievement of high throughput,high accuracy,high design freedom,and a broad range of material structuring capabilities remains a long-pending challenge.To address the issue,we propose an acousto-optic scanning with spatial-switching multispots(AOSS)method.Inertia-free acousto-optic scanning and nonlinear swept techniques have been developed for achieving ultrahigh-speed and aberration-free scanning.Moreover,a spatial optical switch concept has been implemented to significantly boost the lithography throughput while maintaining high resolution and high design freedom.An eight-foci AOSS system has demonstrated a record-high 3D printing rate of 7.6×10^(7)voxel s^(-1),which is nearly one order of magnitude higher than earlier scanning MPL,exhibiting its promise for future scalable 3D nanomanufacturing.