镀膜技术及设备

摘要

O494.1 95021083由低温退火轻掺杂控制α—Si:H膜的固相晶化成核=Nucleation mechanism of the solid phasecrystallization of α Si:H films controlled bylightly doping in low temperature annealing[刊,中]/杜开瑛,饶海波(四川大学物理系)∥物理学报.—1994.43(6).