A numerical model is developed for the calculation of transient temperature field of thin film coating induced by a long-pulsed high power laser beam. The electric field intensity distribution of HfO2/SiO2 high reflective (HR) film is investigated to calculate the thermal field of the film. The thermal-mechanical relationships are discussed to predict the laser damage area of optical thin film under long pulse high energy laser irradiation.
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机译:a comparative study of optical and radiative characteristics of X-ray-induced luminescent defects in ag-doped glass and LiF thin films and their applications in 2-D imaging