首页> 中文期刊> 《中国化学快报:英文版》 >Effective norfloxacin elimination via photo-Fenton process over the MIL-101(Fe)-NH_(2)immobilized onα-Al_(2)O_(3)sheet

Effective norfloxacin elimination via photo-Fenton process over the MIL-101(Fe)-NH_(2)immobilized onα-Al_(2)O_(3)sheet

         

摘要

MIL-101(Fe)-NH_(2)@Al_(2)O_(3)(MA)catalysts were successfully synthesized by reactive seeding(RS)method onα-Al_(2)O_(3)substrate,which demonstrated excellent photo-Fenton degradation performance toward fluoroquinolone antibiotics(i.e.,norfloxacin,ciprofloxacin,and enrofloxacin).The structure and morphology of the obtained MA were characterized by transmission electron microscopy(TEM),high-resolution transmission electron microscopy(HRTEM),atomic force microscope(AFM).The as-prepared MA could accomplish>90%of norfloxacin degradation efficiency for 10 cycles’photo-Fenton processes,owing to its excellent chemical and water stability.In addition,the effects of operational factors including H_(2)O_(2)concentration,foreign ions,and pH on the photo-Fenton degradation of norfloxacin over MA were clarified.The ESR spectra further document that^(•)O_(2)^(−),1O_(2)and•OH radicals are prominent in the decomposition process of antibiotic molecules.Finally,the plausible photo-Fenton norfloxacin degradation mechanisms were proposed and verified.

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