极低散射光学表面微观形貌评价技术研究

摘要

Combined with the power spectral density and the reflection grating model, space wavelength of 0.37~ 0.895μm range of harmonic causes scattering of the mirror. The processing improvement direction reduces the space of harmonic wavelength range. The substrates of pitch polishing and chemical mechanical polishing are selected, the roughness is essentially the same. Space wavelength of 0.37~ 0.895μm range, the harmonic of Chemical mechanical polishing substrate is weaker than pitch polishing. After coating, the scattering of chemical mechanical polishing is smaller. The experimental results is consistent with theoretical analysis.%　　在频域内利用微观轮廓功率谱密度和反射光栅模型得出：基片表面微观形貌在空间波长0.37~0.895滋m范围内的谐波分量是造成反射镜散射的主要因素，据此指出加工工艺改进方向应为降低该空间波长范围内的谐波分量。选取沥青抛光和化学机械抛光的试件，表面粗糙度值近似相同，二维功率谱密度曲线在空间波长0.3滋m附近出现交叉，空间波长0.37~0.895滋m 范围内，化学机械抛光试件比沥青抛光试件表面谐波分量弱。基片镀膜后，化学机械抛光的试件散射值小，实验结果与理论分析一致。