注入器Ⅱ离子源控制系统设计

摘要

为实现离子源设备的远程监控、束流强度可调和当设备发生异常时的快速切束控制,采用PLC、串口服务器和自制FPGA控制板卡设计了基于EPICS架构的离子源控制系统.同时,改进了原有PLC和电机系统的EPICS IOC程序.整套系统工作可靠、稳定,完全满足注入器Ⅱ系统的调试运行需求.快速切束时间小于10 μs,完全切束动作在60 s内完成.%In order to remotely monitor the instrument,adjust the beam intensity and cut off the beam quickly in exceptional cases,the ion source control system which is based on the EPICS architecture was designed by using PLC,serial device server and FPGA control board.At the same time,the EPICS IOC programs for the motor and PLC system were improved.The whole system is reliable,stable and can meet the commissioning requirement of injector Ⅱ.The beam fast cut-off time is less than 10 μs and the entire process time of cut-off beam to be completed is within 60 s.