CVD法制备硅硼碳氮陶瓷的化学反应热力学研究

摘要

The chemical reaction thermodynamic of the chemical vapor deposition in the SiCl3CH3–BCl3–NH3–H2system was investigated. Based on the thermochemistry data which are calculated in the early works, with the principle of chemical equilibrium, the distribution of the equilibrium concentration of the species and the production of the specific solid phases at different reaction parameters of the CVD process in the system are obtained respectively. It is instructive to experiments at any new conditions.%本文针对制备SiBCN 陶瓷所用的SiCl3CH3–BCl3–NH3–H2体系，基于已建立的热化学数据库，根据化学平衡原理，确定了不同工艺参数下各反应体系中一些重要产物的平衡产量分布，给出了相应体系的固相产物分布规律，为实验研究提供可靠的理论参考。