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APPLICATION OF MINIMUM PROJECTION UNIFORMITY CRITERION IN COMPLEMENTARY DESIGNS

         

摘要

In this article,we consider the characterization problem in design theory.The objective is to characterize minimum projection uniformity for two-level designs in terms of their complementary designs.Here,the complementary design means a design in which all the Hamming distances of any two runs are the same,which generalizes the concept of a pair of complementary designs in the literature.Based on relationships of the uniformity pattern between a pair of complementary designs,we propose a minimum projection uniformity(MPU) rule to assess and compare two-level factorials.

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