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Evidence for relaxation of xenon-129 by paramagnetic impurities on rubidium hydride surfaces.

机译:氢化rub表面上的顺磁性杂质使氙129弛豫的证据。

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Data are presented on the wall-induced spin-relaxaton rates of 129Xe in glass cells in winch the interior walls are coated with rubidium hydride (RbH). The relaxation rates have been measured as a function of both magnetic field and temperature. The relaxation rates have been measured at fields ranging from 0.01--1.00 Tesla, and are found to decrease significantly with increasing magnetic field These magnetic decoupling curves are qualitatively similar for cells coated with both rubidium hydride as well as rubidium deuteride. The characteristic widths of the decoupling curves show only mild variation with temperature over the range of 223 K--323 K. The observed behavior of the relaxation is consistent with that expected due to paramagnetic sites, although the correlation times of the interactions are surprisingly long, on the order of 10--30 picoseconds.
机译:数据显示的是绞盘玻璃室内壁诱导的自旋弛豫速率为129Xe,内壁涂有氢化rub(RbH)。已经测量了弛豫率与磁场和温度的关系。在0.01--1.00特斯拉范围内测量了弛豫率,发现随着磁场的增加弛豫率显着降低。这些磁解耦曲线在质量上与氢化coated和氘化coated包被的细胞相似。解耦曲线的特征宽度在223 K--323 K范围内仅显示出随温度的轻微变化。尽管相互作用的相关时间长得令人惊讶,但观察到的弛豫行为与顺磁位点所预期的行为一致,大约为10--30皮秒。

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