首页> 外文学位 >Characterization of p-type wide band gap transparent oxide for heterojunction devices.
【24h】

Characterization of p-type wide band gap transparent oxide for heterojunction devices.

机译:用于异质结器件的p型宽带隙透明氧化物的表征。

获取原文
获取原文并翻译 | 示例

摘要

Transparent p-type CuCr1-xMgxO2 wide band gap oxide semiconductor thin films were deposited over quartz substrates by chemical spray pyrolysis technique using metalloorganic precursors. A mechanism of synthesis of CuCrO2 films involving precursor decomposition, oxidation, and reaction between constituent oxides in the spray deposition process is presented. Crystalline single phase CuCrO2 delafossite structure was dominant in ≥700ºC argon ambient annealed films but the as-deposited films contained spinel CuCr2O4 mixed phases as shown by XRD and XPS studies. Spin-orbital energy ~9.8eV in Cr 2p electron spectra consistent with Cr3+ valence state and Cr 2p3/2 resolved peaks show mixed valence state on Cr4+/Cr 6+ confirming CuCr1-xMgxO2 compound phase in the films. Effect of substrate temperature, film thickness, and acceptor Mg2+ doping on crystallographic structure, optical, electrical conductivity and thermoelectric coefficient was investigated. The invariance of the alpha- and increase of the c-lattice parameter with Mg concentration suggests that Mg2+ ions are introduced at the Cr3+ site. Highly transparent ≥80% CuCr0.93Mg 0.07O2 films with direct and indirect optical band gaps 3.08 and 2.58eV for 155 nm and 3.14 and 2.79eV for 305nm thin films, respectively were obtained. Photoluminescence emission bands at 532 and 484nm interpreted to arise from 3d94s1 and 3d10 Cu+ intra-band transitions.;Electrical conductivity of CuCr0.93Mg0.07O 2 films ranged from 0.6-1.0 Scm-1 and exhibits activation energies ~0.11eV in 300-420K and ~0.23eV in ≥ 420K region ascribed to activated conduction and grain boundary trap assisted conduction, respectively. Restricted by the Mg solubility, the substituted Mg dopants limited to x≤0.05 are only able to contribute to the optimum hole carrier in the range ~2-4x10 19cm-3 and thus no substantial increase of electrical conductivity could be realized with increased Mg concentration. A major fraction of Mg atoms do not act as acceptor, but beyond the low solubility limit act as defect centers. Transparent p-CuCrO2/n-ZnO heterojunction diodes showing rectifying current-voltage characteristics were fabricated. The forward to reverse bias current ratio was estimated as ~128 and ~108 at +/-1V and +/-2V, respectively. Built-in voltages of p-CuCrO2 /n-ZnO heterojunctions discerned from small signal capacitance measurement are 1.27 and 0.67V, attributed to the alignment of Fermi level and distribution of interface trap states, respectively.
机译:使用金属有机前体通过化学喷雾热解技术在石英衬底上沉积透明的p型CuCr1-xMgxO2宽带隙氧化物半导体薄膜。提出了CuCrO2薄膜的合成机理,该机理涉及前体分解,氧化以及在喷涂过程中组成氧化物之间的反应。 XRD和XPS研究表明,在≥700ºC的氩气环境退火膜中,结晶单相CuCrO2铜铁矿结构占主导地位,但沉积后的膜包含尖晶石CuCr2O4混合相。 Cr 2p电子光谱中的自旋轨道能量〜9.8eV与Cr3 +价态一致,并且Cr 2p3 / 2解析峰在Cr4 + / Cr 6+上显示出混合价态,从而确认了薄膜中的CuCr1-xMgxO2复合相。研究了衬底温度,薄膜厚度和受主Mg2 +掺杂对晶体结构,光学,电导率和热电系数的影响。 c晶格参数的α值和c晶格参数随Mg浓度的增加的不变性表明,Mg2 +离子是在Cr3 +位点引入的。获得了高度透明的,≥80%的CuCr0.93Mg 0.07O2薄膜,分别在155 nm和305nm薄膜上具有直接和间接的光学带隙3.08和2.58eV,而在305nm薄膜上具有3.14和2.79eV。 532和484nm处的光致发光发射带被认为是由3d94s1和3d10 Cu +带内跃迁引起的; CuCr0.93Mg0.07O 2薄膜的电导率范围为0.6-1.0 Scm-1,在300-420K中表现出约0.11eV的激活能在≥420K的区域中约为0.23eV,分别归因于激活传导和晶界陷阱辅助传导。受Mg溶解度的限制,被限制为x≤0.05的Mg掺杂剂只能对〜2-4x10 19cm-3范围内的最佳空穴载流子作出贡献,因此,随着Mg浓度的增加,电导率将无法实现实质性的增长。 。 Mg原子的主要部分不充当受体,但超过低溶解度极限则充当缺陷中心。制作了具有整流电流-电压特性的透明p-CuCrO2 / n-ZnO异质结二极管。正向和反向偏置电流比在+/- 1V和+/- 2V时分别估计为〜128和〜108。从小信号电容测量中可以看出,p-CuCrO2 / n-ZnO异质结的内置电压分别为1.27和0.67V,这分别归因于费米能级的对准和界面陷阱态的分布。

著录项

相似文献

  • 外文文献
  • 中文文献
  • 专利
获取原文

客服邮箱:kefu@zhangqiaokeyan.com

京公网安备:11010802029741号 ICP备案号:京ICP备15016152号-6 六维联合信息科技 (北京) 有限公司©版权所有
  • 客服微信

  • 服务号