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Preliminary parameters for Roll-to-Roll (R2R) overlay photolithography directly onto flexible substrates.

机译:卷对卷(R2R)的光刻工艺的直接参数可直接在柔性基板上进行。

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摘要

Flexible electronics is a field that is driving semiconductor technology to explore new materials that are flexible and pushing the envelope in patterning technologies. In this work, flexible electronics refers to substrates that are bendable, conformally shaped and lightweight and that can be Roll-to-Roll (R2R) manufacturable. Unlike the current generation of flexible electronics that are developed on flat pieces of substrates such as glass and silicon wafers, this dissertation deals with circuit fabrication directly on unsupported flexible substrates using high resolution photolithography.;This research provides parameters for the photolithographic process to develop two layer stacked (overlay) flexible substrates that are unsupported and R2R manufactured. Such flexible substrates are polyethylene terephthalate (PET) and polyimide (PI). Overlay data are utilized to characterize the photolithography process by using overlay glass substrates data as a comparison to the overlay flexible substrates data. Overlay data are acquired by the photolithography equipment after finding optical alignment fiducials using the reflective alignment system (RAS) prior to exposing the second layer on the substrates. Optical verniers are also utilized to measure the overlay offset of the patterned flexible substrates in order to corroborate that large area flexible electronics R2R manufacturing is achievable. Consequently, overlay offsets are graphed in control charts, thus characterizing the behavior of such charts to identify runs rules for the photolithography process parameters.;Other objectives of this research endeavor is the analysis and attempt to breach the gap for within virtual plate (VP) (area of substrate exposure: 200x250mm) and virtual plate to virtual plate (VP-to-VP) stitching. At the same time, parameters for develop, etch and stripping (wet chemical) processes, along with work instruction procedures, are established.;Behavioral trends of the various substrates are identified through the work that involved the development of artwork overlay of unsupported flexible substrates while applying comparison techniques such as descriptive statistics, run-charts, control charts among other SPC techniques. Thus, an understanding of the process conditions and their effects on the photolithographic and wet chemical processes are detailed in this research.
机译:柔性电子学是一个驱动半导体技术探索柔性新材料并推动构图技术领域发展的领域。在这项工作中,柔性电子产品是指可弯曲,保形且重量轻且可以卷对卷(R2R)制造的基板。不同于当前在玻璃和硅片等平坦基板上开发的柔性电子产品的这一代,本论文使用高分辨率光刻技术直接在无支撑的柔性基板上进行电路制造。层堆叠(覆盖)的无支撑柔性基板,并且已制造R2R。这种柔性基材是聚对苯二甲酸乙二酯(PET)和聚酰亚胺(PI)。通过使用覆盖玻璃基板数据作为与覆盖柔性基板数据的比较,利用覆盖数据来表征光刻工艺。在将第二层曝光在基板上之前,使用反射对准系统(RAS)找到光学对准基准之后,由光刻设备获取叠加数据。光学游标也被用于测量图案化的柔性基板的覆盖偏移,以证实可以实现大面积的柔性电子设备R2R的制造。因此,在控制图中绘制了覆盖偏移量,从而表征了这些图表的行为,从而确定了光刻工艺参数的运行规则。这项研究的其他目标是分析并尝试突破虚拟印版(VP)的差距(基材暴露区域:200x250mm)和虚拟板到虚拟板(VP-to-VP)的缝合。同时,建立了用于显影,蚀刻和剥离(湿化学)工艺的参数以及工作指导程序。通过涉及无支撑柔性基板的艺术品覆盖层开发工作,确定了各种基板的行为趋势。同时应用比较技术,例如描述统计,运行图,控制图以及其他SPC技术。因此,本研究详细介绍了对工艺条件及其对光刻和湿化学工艺的影响的理解。

著录项

  • 作者

    Yepez, Denisse E.;

  • 作者单位

    State University of New York at Binghamton.;

  • 授予单位 State University of New York at Binghamton.;
  • 学科 Engineering Industrial.
  • 学位 Ph.D.
  • 年度 2014
  • 页码 201 p.
  • 总页数 201
  • 原文格式 PDF
  • 正文语种 eng
  • 中图分类 水产、渔业;
  • 关键词

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