Development of large array auto write-scan photoresist fabrication and inspection system.

摘要

Current metrology methods involve technicians viewing through a microscope, increasing the time, cost, and error rate in inspection. Developing an automated inspection system eliminates these difficulties. Shown in this work is a laser scanning microscope (LSM) design for an opto-electronic detection system (OEDS), based upon the concept that intensity differences related to pattern defects can be obtained from reflections off fused silica samples coated with photoresist (PR) or Aluminum. Development of this system for data collection and processing is discussed. Results show that 2.1 &mgr;m resolution of these defects is obtainable. Preliminary results for larger-array patterns through stitching processes are also shown. The second part of this work uses the concept of phase contrast edge detection. Looking at non-metallized patterns, one can use the property that phase changes induced by a refractive-index sensitive material can be seen with a multi-cell array, rendering the image visible by comparing the respective phases. A variety of defects and samples are shown. Extrapolating results to larger arrays is also discussed. Latent imaging, or imaging without development, is also evaluated. Future work in the areas of system commercialization, sample storage, and other mass-printing techniques are discussed.