Inorganic Surface Modification of Nonwoven Polymeric Substrates.

摘要

In this study, atomic layer deposition (ALD), a vapor phase inorganic thin film deposition technique, is used to modify the surface of a range of industrially relevant polymers to enhance surface properties or impart additional functionalities. Several unique demonstrations of polymer surface modification are presented including uniform nanomaterial photodeposition to the surface of nonowoven fabrics and the first application of photocatalytic thin film coated nonwovens for advanced filtration of heavy metals from solution. Recent advances in polymer synthesis and processing technologies have resulted in the production of novel polymer systems with unique chemistries and sub-micron scale dimensions. As a result, advanced fiber systems have received much attention for potential use in a wide range of industrially and medically important applications such as advanced and selective filtration, catalysis, flexible electronics, and tissue engineering. However, tailoring the surface properties of the polymer is still needed in order to realize the full range of advanced applications, which can be difficult given the high complexity and non-uniformity of nonwoven polymeric structures. Uniform and controllable inorganic surface modification of nonwovens allows the introduction or modification of many crucial polymer properties with a wide range of application methods.