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X-ray absorption studies of aluminum and niobium interface reactions and of krypton-implanted in solid materials.

机译:铝和铌界面反应以及固体材料中植入k的X射线吸收研究。

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摘要

X-ray absorption experiments using synchrotron radiation have been carried out to study ion-beam induced aluminum and niobium interface reactions and to study the formation of krypton precipitates in solid materials. The interface structure of bilayered Al and Nb prepared by sputtering onto a float glass substrate is studied using glancing angle EXAFS (extended x-ray absorption fine structure) and x-ray reflectivity. For the as-sputtered sample, the reflectivity data suggest a sharp Al surface and Al/Nb interface on a local scale, with a roughness corresponding to only a few atomic steps. The Nb K-edge EXAFS results indicate that the Nb atoms in the interface region are in the same body-centered-cubic structure as the bulk metal. However, a small number of Nb-Al bonds are identified. Ion-beam irradiation with 1 {dollar}times{dollar} 10{dollar}sp{lcub}16{rcub}{dollar} Al/cm{dollar}sp2{dollar} resulted in the formation, between the Al and Nb layers, of an amorphous layer in which the Nb-Al pairs exhibit greater disorder than the Nb-Nb pairs. Irradiation with 1.5 {dollar}times{dollar} 10{dollar}sp{lcub}17{rcub}{dollar} Al/cm{dollar}sp2{dollar} led to a less well defined interface. The high sensitivity of glancing angle EXAFS in probing the interface structure is demonstrated. The krypton local environment in niobium, aluminum, graphite and Grafoil hosts is investigated by measuring the Kr K-edge absorption spectrum. The near-edge data (XANES) demonstrate that krypton atoms form precipitates in samples implanted to high dosages ({dollar}ge{dollar}5 {dollar}times{dollar} 10{dollar}sp{lcub}16{rcub}{dollar} Kr/cm{dollar}sp2{dollar}). The precipitates appear to be in the solid phase in the Nb hosts even at 300 K, but exist in both solid and non-solid forms in Al, graphite and Grafoil hosts. The lattice parameter values estimated from XANES data suggest a high pressure in the range of 2-10 GPa within the solid precipitates. In addition, the structural modification of iron, nickel and copper metals by Kr implantation is studied by EXAFS measurements at the metal K edges using total electron yield detection.
机译:已经进行了使用同步加速器辐射的X射线吸收实验,以研究离子束诱导的铝和铌界面反应,并研究固体材料中k沉淀物的形成。使用掠射角EXAFS(扩展的X射线吸收精细结构)和X射线反射率研究了通过溅射在浮法玻璃基板上制备的双层Al和Nb的界面结构。对于溅射后的样品,反射率数据表明在局部尺度上具有清晰的Al表面和Al / Nb界面,其粗糙度仅对应于几个原子台阶。 Nb K边缘EXAFS结果表明,界面区域中的Nb原子与本体金属的体心立方结构相同。但是,鉴定出少量的Nb-Al键。 Al / cm {dollar} sp2 {dollar}的离子束辐照量为1 {dollar}倍{dollar} 10 {dollar} sp {lcub} 16 {rcub} {dollar} Al / cm {dollar} sp2 {dollar}导致在Al和Nb层之间形成Nb-Al对表现出比Nb-Nb对更大的无序性的非晶层。用1.5 {dollar}次{dollar} 10 {dollar} sp {lcub} 17 {rcub} {dollar} Al / cm {dollar} sp2 {dollar}进行辐照会导致定义不明确的界面。展示了掠角EXAFS在探测界面结构方面的高灵敏度。通过测量Kr K边缘吸收光谱,研究了铌,铝,石墨和Grafoil主体中的local局部环境。近边缘数据(XANES)表明,rypto原子在高剂量注入的样品中形成沉淀({美元} ge {美元} 5 {美元}次{美元} 10 {美元} sp {lcub} 16 {rcub} {美元} Kr / cm {dollar} sp2 {dollar})。甚至在300 K时,沉淀物在Nb主体中似乎都处于固相状态,但在Al,石墨和Grafoil主体中以固相和非固体形式存在。根据XANES数据估算的晶格参数值表明,固体沉淀物中的高压范围为2-10 GPa。此外,通过EXAFS测量使用总电子产率检测金属K边缘处的EXAFS,研究了通过Kr注入对铁,镍和铜金属进行的结构改性。

著录项

  • 作者

    Tan, Zhengquan.;

  • 作者单位

    University of Connecticut.;

  • 授予单位 University of Connecticut.;
  • 学科 Physics Condensed Matter.
  • 学位 Ph.D.
  • 年度 1990
  • 页码 168 p.
  • 总页数 168
  • 原文格式 PDF
  • 正文语种 eng
  • 中图分类 O49;
  • 关键词

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