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Characterization and removal of organic contaminants in ultrapure water systems.

机译:超纯水系统中有机污染物的表征和去除。

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Ultrapure water is becoming increasingly important to the semiconductor, pharmaceutical and power industries. Stricter industrial requirements concerning water purity can be realized from pilot scale research. Such a system was designed and operated to determine improved methods to characterize and remove organic contaminants in industrial scale ultrapure water systems.; Theoretical modelling of the polishing loop was performed for variable order kinetics; intrinsic reaction parameters were developed, and are potentially scaleable to larger systems. Application of the population balance to the actions of process components on organic particle distributions generated novel oxidation and fragmentation parameters that are scaleable to larger systems. Optimization of bacterial growth media resulted in the increased detection of viable bacterial concentrations. A significant fraction of TOC in the polishing loop was found to exist as assimilable organic carbon; the action of process components, thought to remove contaminants, can generate bacteria nutrients from more complex organics.; The situating of a polymeric filter before a UV unit resulted in increased removal of organic contaminants; reversing the sequence enhanced the removal of low molecular weight and low charge to mass ratio compounds. The combination of UV-185 and dissolved ozone resulted in synergistic removal of organic contaminants from ultrapure water. The invention of a novel catalytic filter designed to physically separate and then oxidize contaminants resulted in enhanced removal of organics from ultrapure water. A study of viruses in ultrapure water showed that UV-185 and ozone effectively removed viruses, yet ion exchange gave only two orders of magnitude removal in viable counts.; This research may be used to augment present systems and/or design new systems. Continued research along the lines specified in this document will generate further understanding of ultrapure water and ultrapure water systems.
机译:超纯水对半导体,制药和电力行业正变得越来越重要。从中试规模研究可以实现对水纯度的更严格的工业要求。设计和运行这样的系统,以确定在工业规模超纯水系统中表征和去除有机污染物的改进方法。进行了抛光循环的理论建模,以得到可变阶动力学。已经开发出固有的反应参数,并有可能扩展到更大的系统。将种群平衡应用于过程组件对有机颗粒分布的作用会产生新的氧化和破碎参数,这些参数可扩展至更大的系统。细菌生长培养基的优化导致增加了可行细菌浓度的检测。发现在抛光回路中有很大一部分的TOC以可吸收的有机碳形式存在。被认为去除污染物的过程组件的作用可以从更复杂的有机物中产生细菌营养。在紫外线装置之前放置聚合物过滤器会增加有机污染物的去除;逆转序列可提高低分子量和低电荷质量比化合物的去除率。 UV-185和溶解的臭氧的组合可协同去除超纯水中的有机污染物。新颖的催化过滤器的发明旨在物理上分离污染物然后氧化污染物,从而提高了从超纯水中去除有机物的能力。一项对超纯水中病毒的研究表明,UV-185和臭氧可有效去除病毒,但离子交换仅能去除两个数量级的活菌。该研究可以用于扩充现有系统和/或设计新系统。继续按照本文档中指定的方式进行研究将进一步了解超纯水和超纯水系统。

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