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Phase chemistry, thermodynamic and kinetic characterization of interfacial reaction between aluminum nitride and titanium.

机译:氮化铝和钛之间界面反应的相化学,热力学和动力学表征。

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摘要

Interfacial reaction between AlN and Ti was characterized in terms of phase chemistry, thermodynamics and diffusional layer growth kinetics. First, the phase equilibria and thermochemistry of the Ti-Al-N system were evaluated by a combination of experimentation and thermodynamic calculation. Various powder mixtures and reaction couples were annealed in an inert atmosphere followed by phase and composition analyses using x-ray powder diffractometry and analytical electron microscopy. The previous Ti-Al-N phase diagram was revised and extended over a much wider range, 900 K to 1873 K. The most significant revisions were made in the aluminum rich region. A new ternary nitride, ;The thermodynamics of Ti-N and ;The growth kinetics of the reaction layers of AlN-Ti reaction couples were characterized both experimentally and theoretically. Growth of all reaction layers followed a parabolic rate dependence. By combining the growth kinetics and thermodynamics, chemical diffusion coefficients and component activity profiles across the reaction zone were estimated. Diffusion mechanisms of both aluminum and nitrogen in TiN were proposed. Phase stability diagrams were constructed to help understand the reaction sequence and phase evolution.;An attempt to clear up the uncertainty of the existence of ;Finally, the interfacial reaction zone between AlN and Ti was characterized by high resolution scanning electron microscopy (HRSEM) and transmission electron microscopy (TEM). Convergent-beam electron diffraction (CBED) and selected-area electron diffraction (SAD) patterns were used for phase identification. The chemistry of the TiN layer was analyzed by electron energy loss spectroscopy (EELS). It was shown that small amounts of aluminum dissolved in TiN but it was not clear as to whether aluminum segregated preferentially to the grain boundaries. Overall morphology of the reaction zone were examined in detail by HRSEM. An interesting feature was that the TiN layer was found to be porous for certain reaction conditions.
机译:AlN和Ti之间的界面反应通过相化学,热力学和扩散层生长动力学来表征。首先,通过实验和热力学计算相结合,评估了Ti-Al-N体系的相平衡和热化学性质。各种粉末混合物和反应对在惰性气氛中退火,然后使用X射线粉末衍射仪和分析电子显微镜对相和组成进行分析。先前的Ti-Al-N相图已修订并扩展到900 K至1873 K的更宽范围内。最重要的修订是在富铝区域进行的。通过实验和理论表征了一种新的三元氮化物; Ti-N的热力学和; AlN-Ti反应对的反应层的生长动力学。所有反应层的生长遵循抛物线速率依赖性。通过结合生长动力学和热力学,估算了整个反应区的化学扩散系数和组分活性曲线。提出了铝和氮在TiN中的扩散机理。构造了相稳定性图以帮助理解反应顺序和相演化。试图消除存在的不确定性;最后,通过高分辨率扫描电子显微镜(HRSEM)表征了AlN和Ti之间的界面反应区透射电子显微镜(TEM)。会聚束电子衍射(CBED)和选择区域电子衍射(SAD)图用于相位识别。 TiN层的化学成分通过电子能量损失谱(EELS)分析。结果表明,少量的铝溶解在TiN中,但是尚不清楚铝是否优先偏析在晶界上。通过HRSEM详细检查了反应区的整体形态。一个有趣的特征是,在某些反应条件下,发现TiN层是多孔的。

著录项

  • 作者

    Lee, Hee Dong.;

  • 作者单位

    Arizona State University.;

  • 授予单位 Arizona State University.;
  • 学科 Engineering Materials Science.
  • 学位 Ph.D.
  • 年度 1993
  • 页码 121 p.
  • 总页数 121
  • 原文格式 PDF
  • 正文语种 eng
  • 中图分类 工程材料学;
  • 关键词

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