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Laue diffraction, UV reflectivity, and Erbium(3+)-related luminescence studies in silicon carbide polytypes.

机译:碳化硅多型体中的劳厄衍射,紫外反射率和与((3+)相关的​​发光研究。

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摘要

xperimental and computer simulated transmission Laue diffraction patterns are presented for 4H, 6H, and 15R SiC in the ;Photoluminescence investigations of erbium implanted SiC polytypes 3C, 4H, 6H, and 15R are presented. The intra 4f-shell, ;Room temperature electroluminescence investigations of erbium implanted 6H SiC p-n junctions are presented. There is no significant difference between the Er;Room temperature uv-reflectivity measurements are presented for the SiC polytypes 3C, 4H, 6H, and 15R. The experimental uv-reflectivity spectra are compared to the spectra calculated by Professors W. R. L. Lambrecht and B. Segall at Case Western Reserve University, Cleveland, Ohio, using Linear Muffin Tin Orbital band structure calculations. The distinguishing spectral feature is a peak near 7 eV in the non-cubic polytypes. This feature is associated with a region of k space near the T (i.e.
机译:给出了4H,6H和15R SiC的实验和计算机模拟透射Laue衍射图;展示了注入implant的SiC多型3C,4H,6H和15R的光致发光研究。提出了内部4f壳,R注入6H SiC p-n结的室温电致发光研究。对于SiC多晶型3C,4H,6H和15R,Er;室温uv反射率测量值之间没有显着差异。使用线性松饼锡轨道能带结构计算,将实验的紫外反射光谱与由俄亥俄州克利夫兰凯斯西储大学的W. R. L. Lambrecht和B. Segall教授计算的光谱进行比较。显着的光谱特征是在非立方多型体中接近7 eV的峰。该特征与T附近的k个空间区域(即

著录项

  • 作者

    Yoganathan, Murugesu.;

  • 作者单位

    University of Pittsburgh.;

  • 授予单位 University of Pittsburgh.;
  • 学科 Physics Condensed Matter.;Physics Radiation.;Physics Optics.
  • 学位 Ph.D.
  • 年度 1996
  • 页码 249 p.
  • 总页数 249
  • 原文格式 PDF
  • 正文语种 eng
  • 中图分类
  • 关键词

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