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Improvements in the characterization of polycrystalline thin films: Microchemistry, microtexture, and microstructure.

机译:多晶薄膜表征的改进:微观化学,微观纹理和微观结构。

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摘要

Materials properties often depend critically on microstructure, especially in polycrystalline thin films. Improvements in characterization techniques are necessary to improve our understanding of structure-property relationships. In this work, we develop improvements for the quantitative measurement of grain boundary segregation, crystallographic texture, and the grain size distribution.; Low-magnification X-ray mapping has been developed in the analytical electron microscope (AEM) to allow large numbers of grain boundaries to be probed in parallel rather than in series as is conventionally done. Segregation measurements on an Al-4 wt.% Cu thin film metallization material show wide variation in the magnitude of Cu segregation, which may have implications for its electromigration (EM) reliability. This wide variation implies that typical measurements from ∼10 grain boundaries may be insufficient to properly characterize a material.; Electron backscatter diffraction (EBSD) has been used to characterize the texture of Al and Cu metallization materials, and quantitative comparison to X-ray diffraction (XRD) shows good agreement. The data processing applied to the raw EBSD data has a substantial effect on the result, and typical analyses have particular problems when applied to strongly-textured thin film materials. Improved analysis software has been developed which overcomes several conventional limitations, resulting in improved sensitivity to minor texture components compared to XRD and conventional EBSD analysis. A total of ∼1 vol% of unexpected (100)- and (221)-textured grains were observed in Al films with improved processing, while neither conventional EBSD nor XRD detected them. This may have implications for the EM reliability of these materials.; Automated microstructural analysis software has been developed and applied to quantify the grain size distribution of over 8000 grains from transmission electron microscope (TEM) images of an Al thin film. This involved improvements to both the TEM image acquisition and the subsequent data analysis, including the development of several novel image processing algorithms. Automated analysis has been shown to give results consistent with manual analysis, but with the added advantage of consistency. Improved statistics (compared to typical populations of ∼100 grains) are necessary for better quantification of a material's behavior, especially in the tails of the distribution which are often important for thin film properties such as EM resistance.
机译:材料的性能通常主要取决于微观结构,尤其是在多晶薄膜中。表征技术的改进对于增进我们对结构-特性关系的理解是必要的。在这项工作中,我们开发了用于定量测量晶界偏析,晶体结构和晶粒尺寸分布的改进方法。在分析电子显微镜(AEM)中已经开发了低倍X射线映射,可以并行而不是按常规方式探查大量晶界。在Al-4%(重量)的Cu薄膜金属化材料上的偏析测量结果表明,Cu偏析的幅度存在很大差异,这可能对其电迁移(EM)可靠性有影响。这种巨大的差异意味着从约10个晶界进行的典型测量可能不足以正确表征材料。电子背散射衍射(EBSD)已用于表征Al和Cu金属化材料的质构,并且与X射线衍射(XRD)的定量比较显示出良好的一致性。应用于原始EBSD数据的数据处理会对结果产生重大影响,并且当应用于强纹理化的薄膜材料时,典型分析存在特定问题。已经开发出了改进的分析软件,该软件克服了一些常规限制,与XRD和常规EBSD分析相比,提高了对次要纹理成分的敏感性。在经过改进处理的Al膜中观察到总共约1%(体积)的意想不到的(100)和(221)纹理晶粒,而常规EBSD和XRD均未检测到。这可能对这些材料的EM可靠性有影响。已经开发了自动化的微结构分析软件,并将其用于量化Al薄膜的透射电子显微镜(TEM)图像中8000多个晶粒的晶粒尺寸分布。这涉及到TEM图像采集和后续数据分析的改进,包括几种新颖图像处理算法的开发。自动化分析已显示出与手动分析一致的结果,但具有一致性的优势。为了更好地量化材料的行为,特别是在分布的尾部,这对于通常的薄膜特性(例如,耐EM性)很重要,因此需要改进的统计数据(与典型的约100个晶粒的数量相比)。

著录项

  • 作者

    Carpenter, Derrick Todd.;

  • 作者单位

    Lehigh University.;

  • 授予单位 Lehigh University.;
  • 学科 Engineering Materials Science.
  • 学位 Ph.D.
  • 年度 1999
  • 页码 180 p.
  • 总页数 180
  • 原文格式 PDF
  • 正文语种 eng
  • 中图分类 工程材料学;
  • 关键词

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