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Aluminum gettering of crystalline silicon for improvement of minority carrier diffusion length and for studies of fundamental diffusion mechanisms.

机译:晶体硅的铝吸杂剂可改善少数载流子扩散长度并用于基本扩散机理的研究。

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摘要

Large-grained, multi crystalline silicon for solar cell applications is a very inhomogeneous material with localized regions of high dislocation density and large impurity and precipitate concentrations which limit solar cell efficiency by acting as carrier recombination sites. Due to slow dissolution of precipitates in multi crystalline silicon, these regions cannot be improved by conventional gettering treatments for removal of metal impurities which give good results for single crystal silicon. Extended, high-temperature aluminum gettering is shown to successfully improve the minority carrier diffusion lengths in these localized, poor quality regions and to homogenize the electrical properties of multicrystalline silicon wafers.; Cold is a substitutional-interstitial impurity in silicon, whereby its diffusion creates non-equilibrium concentrations of the native point defects in silicon, self-interstitials and vacancies. The diffusion. of gold is therefore controlled by the relaxation of these non-equilibrium point defect concentrations by dislocations or surfaces. Deliberate gold contamination of single-crystal, dislocation-free silicon wafers has been performed followed by aluminum gettering of the gold in silicon. It is shown that the aluminum gettering process can successfully getter gold in silicon, and that the outdiffusion of gold from the silicon is controlled by the proximity to the wafer surfaces rather than by proximity to the aluminum gettering layer.; The indiffusion of gold in silicon has been widely demonstrated by experiments and modeling to be dominated by the Kick-Out mechanism, whereby the indiffusion of gold causes supersaturation of self-interstitials, with a minimal contribution from the Frank-Turnbull mechanism, whereby the indiffusion of gold causes undersaturation of vacancies. Fitting of the above-mentioned experimental results on aluminum gettering of gold has been done to show that the opposite holds true for outdiffusion of gold, i.e., the Frank-Turnbull mechanism has the dominant contribution. The fundamental physical reason for this phenomenon is identified, viz., that the diffusion mechanism that causes supersaturation of a point defect is likely to dominate over the one that causes undersaturation of the other point defect as the concentration gradient for outdiffusion of the supersaturated species is much larger than the concentration gradient for indiffusion of the undersaturated species.
机译:用于太阳能电池应用的大晶粒多晶硅是一种非常不均匀的材料,其局部区域的位错密度高,杂质和沉淀物浓度高,通过充当载流子复合位点限制了太阳能电池的效率。由于沉淀物在多晶硅中的溶解缓慢,因此无法通过常规的用于去除金属杂质的吸气处理来改善这些区域,从而为单晶硅提供了良好的效果。扩展的高温铝吸气剂已成功地改善了这些局部质量较差区域中的少数载流子扩散长度,并使多晶硅晶片的电性能均一。冷是硅中的一种替代间隙杂质,其扩散会在硅,自填间隙和空位中产生非平衡浓度的自然点缺陷。扩散。因此,通过位错或表面松弛这些非平衡点缺陷浓度来控制金的含量。对单晶,无位错的硅晶片进行了故意的金污染,随后铝在硅中吸金。结果表明,铝的吸杂过程可以成功地在硅中吸金,而金从硅中的扩散是通过靠近晶片表面而不是通过靠近铝吸杂层来控制的。硅中金的扩散已被实验和模型广泛证明是受踢出机制支配的,其中金的扩散会引起自填隙子的过饱和,而Frank-Turnbull机理的贡献很小。黄金会导致空缺不足。已经完成了上述实验结果对金的铝吸气剂的拟合,以表明相反的情况对于金的扩散是正确的,即,弗兰克-特恩布尔机制是主要的贡献。确定了此现象的根本物理原因,即,导致点缺陷过饱和的扩散机制可能会比导致另一个点缺陷不饱和的扩散机制占主导地位,因为过饱和物质向外扩散的浓度梯度为比不饱和物质扩散的浓度梯度大得多。

著录项

  • 作者

    Joshi, Subhash Mukund.;

  • 作者单位

    Duke University.;

  • 授予单位 Duke University.;
  • 学科 Engineering Materials Science.
  • 学位 Ph.D.
  • 年度 2000
  • 页码 107 p.
  • 总页数 107
  • 原文格式 PDF
  • 正文语种 eng
  • 中图分类 工程材料学;
  • 关键词

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