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Electronic transitions in the bandgap of copper indium gallium diselenide polycrystalline thin films.

机译:铜铟镓二硒化物多晶薄膜的带隙中的电子跃迁。

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摘要

The electronic properties of polycrystalline copper indium gallium diselenide thin films have been investigated, with emphasis on understanding the distribution and origin of electronic states in the bandgap. The samples studied were working photovoltaic devices with the structure ZnO/CdS/CuIn1−xGa xSe2/Mo, and photovoltaic efficiencies ranging from 8 to 16%. The CdS layer and the p-type CuIn1−xGa xSe2 film create the n+- p junction at the heart of these devices. The samples were investigated using four techniques based on the electrical response of the junction: admittance spectroscopy, drive level capacitance profiling, transient photocapacitance spectroscopy, and transient photocurrent spectroscopy. From these measurements the free carrier densities, defect densities within the bandgap, spatial uniformity, and minority carrier mobilities have been deduced. The sub-bandgap response from the CuIn1−xGaxSe2 film was dominated by two defects. One exhibited a thermal transition to the valence band with an activation energy ranging between 0.1 and 0.3 eV and thermal emission prefactors obeying the Meyer-Neldel rule. The second was detected as an optical transition 0.8 eV from the valence band edge. Neither of these defects exhibited densities that varied systematically with gallium content, implying that they are not directly connected with the group III elements in these alloys. The defect densities also do not clearly correlate with the photovoltaic device performance; however, the position of the 0.8 eV defect lies nearer to mid-gap in the higher gallium, and hence higher band gap, material. This implies that it may be a more important recombination center in these devices and may be partially responsible for the reduced photovoltaic efficiencies observed when Ga/(In + Ga) > 0.4. An additional defect response was observed near mid-gap in films grown by processes known to produce lower quality devices. The influence of defects located at grain boundaries was also investigated by comparisons with a device based on an epitaxial single crystal CuIn1−xGa xSe2 film. The grain boundaries do not appear to contain significant quantities of additional defects with sub-bandgap electronic transitions. Finally, metastabilities in the defect distributions resulting from light exposure were also explored. Understanding these metastable changes is likely to lead to a better understanding of the role of the defects in the bandgap of CuIn1−xGaxSe2 films.
机译:研究了多晶铜铟镓硒化物薄膜的电子性能,重点是了解带隙中电子态的分布和起源。研究的样品是工作的光伏器件,其结构为ZnO / CdS / CuIn 1-x Ga x Se 2 / Mo,光伏效率范围为从8%到16%。 CdS层和 p 型CuIn 1-x Ga x Se 2 薄膜形成这些设备的心脏处的n + - p 连接。基于结的电响应,使用四种技术对样品进行了研究:导纳光谱,驱动级电容分析,瞬态光电容光谱和瞬态光电流光谱。通过这些测量,可以推导出自由载流子密度,带隙内的缺陷密度,空间均匀性和少数载流子迁移率。 CuIn 1-x Ga x Se 2 膜的亚带隙响应主要由两个缺陷决定。一个表现出到价带的热跃迁,其活化能在0.1和0.3 eV之间,并且热发射因子服从Meyer-Neldel规则。第二个被检测为从价带边缘到0.8 eV的光学跃迁。这些缺陷均未显示出随镓含量而系统变化的密度,这表明它们未与这些合金中的III族元素直接相连。缺陷密度也与光伏器件的性能没有明显的相关性。但是,0.8 eV缺陷的位置在较高的镓材料中更接近中间带隙,因此在带隙中的材料也较高。这意味着在Ga /(In + Ga)> 0.4时,它可能是这些设备中更重要的复合中心,并且可能部分归因于光伏效率的降低。在通过已知生产较低质量器件的工艺生长的薄膜中,在中间间隙附近观察到了另外的缺陷响应。通过与基于外延单晶CuIn 1-x Ga x Se 2 电影。子带隙电子跃迁看来,晶界不包含大量的其他缺陷。最后,还探讨了由曝光导致的缺陷分布中的亚稳定性。了解这些亚稳态变化可能会导致人们更好地理解缺陷在CuIn 1-x Ga x Se 2 电影。

著录项

  • 作者

    Heath, Jennifer Theresa.;

  • 作者单位

    University of Oregon.;

  • 授予单位 University of Oregon.;
  • 学科 Physics Condensed Matter.; Engineering Electronics and Electrical.
  • 学位 Ph.D.
  • 年度 2002
  • 页码 148 p.
  • 总页数 148
  • 原文格式 PDF
  • 正文语种 eng
  • 中图分类 无线电电子学、电信技术;
  • 关键词

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