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Surface modification of paper on a continuous atmospheric-pressure-plasma system.

机译:在连续的大气压等离子体系统上对纸张进行表面改性。

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Plasma technologies for the continuous modification of materials in atmospheric-pressure-plasma conditions were used to evaluate the surface modification of paper under different plasma conditions. The generation of hydrophobic layers was used to characterize the efficiency of the originally designed system for future application in the paper industry. Generation of hydrophobic layers was carried out by deposition of thin layers from fluorine containing gases, as well as cross-linking of pre-deposited thin layers of hydrophobic materials, such as fluoropolymers and silicones, in a continuous system plasma reactor (CSPR). Physical and chemical characterization of these layers was carried out by X-ray photoelectron spectroscopy (XPS), atomic force microscopy (AFM), scanning electron microscopy (SEM), contact angle goniometry, and water absorption evaluations. Pure gaseous CF4 and a CF4/CH4 mixture were used to deposit fluorinated layers, rendering paper surfaces with low to moderate relative surface atomic contents of fluorine (2.5 to 16.3%). Morphological characterization revealed that the deposition consists of small clusters of fluorinated species scattered on the surface. Contact angle evaluations (50°–70°) indicated a reduction in the water affinity of the paper.; Thin layers of fluoropolymer pre-deposited on paper surfaces were cross-linked in the presence of CF4, CF4/CH4, and NH 3 plasmas. All of the gases proved to be effective for the cross-linking under different conditions. These cross-linked layers were determined to maintain the original polymer structure, consisting mainly of CF2-CF 2 and small quantities of CFx. Surface characterization by AFM indicated lower roughness values compared to the untreated additive-free paper (45.1 vs 67.1 nm). Paper samples treated by this approach showed a highly hydrophobic character with up to 160° contact angles, and water absorption was reduced by as much as 61.6%.; Silicone layers were cross-linked in the presence of argon and oxygen plasmas. Characterization of the silicone-coated paper indicated, as in the case of fluoropolymers, the retention of the original chemical structure. Surface roughness values (AFM) were in the range of 11.8 to 18.2 nm, evidence of a very smooth surface. High hydrophobicity levels were reached, as shown by contact angles of up to 126°, and water absorption showed a maximum reduction of 76.8%.
机译:用于在大气压等离子体条件下对材料进行连续改性的等离子体技术用于评估在不同等离子体条件下纸张的表面改性。疏水层的产生用于表征最初设计的系统的效率,以供将来在造纸工业中使用。疏水层的产生是通过在连续系统等离子体反应器(CSPR)中从含氟气体中沉积薄层,以及预先沉积疏水材料(例如含氟聚合物和硅树脂)的薄层交联来进行的。通过X射线光电子能谱(XPS),原子力显微镜(AFM),扫描电子显微镜(SEM),接触角测角法和吸水率评估对这些层进行了物理和化学表征。使用纯气态CF 4 和CF 4 / CH 4 混合物沉积氟化层,使纸表面的相对表面原子低至中等氟含量(2.5-16.3%)。形态特征表明,沉积物由分散在表面的氟化物小簇组成。接触角评估(50°–70°)表明纸张的水亲合力降低。预沉积在纸张表面的含氟聚合物薄层在CF 4 ,CF 4 / CH 4 和NH的存在下交联 3 等离子体。在不同条件下,所有气体均证明对交联有效。确定这些交联层以保持原始聚合物结构,该结构主要由CF 2 -CF 2 和少量CF x 。与未处理的无添加剂纸相比,通过AFM进行的表面表征表明粗糙度值较低(45.1 vs 67.1 nm)。用这种方法处理的纸样品表现出高度疏水性,接触角高达160°,吸水率降低了61.6%。有机硅层在氩气和氧气等离子体的存在下交联。与含氟聚合物一样,有机硅涂布纸的特性表明保留了原始化学结构。表面粗糙度值(AFM)在11.8至18.2 nm的范围内,表明表面非常光滑。如高达126°的接触角所示,达到了高疏水性水平,并且吸水率显示最大降低了76.8%。

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