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Performance monitoring and disturbance adaptation for model predictive control.

机译:用于模型预测控制的性能监控和干扰自适应。

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摘要

Model predictive control (MPC) is a widely used advanced process control technique in the process industry. According to the internal model principle, the internal model of MPC has to include both exact plant and disturbance models to be optimal. However, in practice, the MPC usually assumes a step-like disturbance or a fixed disturbance model. As a result, the MPC will be suboptimal when disturbance changes slowly. Moreover, it lacks a tool assessing the optimality of control performance in terms of the MPC model.;In this dissertation, a new MPC disturbance adaptation method is presented. Starting from a single-input-single-output (SISO) semiconductor manufacturing process, we replaced the conventional run-to-run controller by an adaptive EWMA controller. It is shown that the plant model mismatch can be compensated by adapting the disturbance model. Analysis has been done to show that the adaptive controller is stable and converges to the optimal controller.;The proposed method is then extended to multi-input-multi-output (MIMO) systems. For the ease of practical applications, the integrated moving average (IMA) model with order (1,1) is recommended. The equivalence between the IMA(1,1) parameter and the prediction error filter constant in commercial MPC has been established. Implementation of disturbance adaptation is explained.;Another disturbance modeling tool is presented. It focuses on the closed-loop identification of a nonparametric disturbance model. The method incorporates the plant model information during the conversion from observer Markov parameters to system Markov parameters.;A new control performance assessment method evaluating MPC model quality is then presented. Feedback invariant principle is introduced, based on which a method estimating disturbance innovations is given. A model quality index is developed as the performance benchmark, which compares prediction errors with disturbance innovations. It is shown that the model quality index related to the MPC performance index.;Most industrial processes are optimized by a linear programming (LP) problem on top of the MPC. A new control performance monitoring method for cascaded LP-MPC system is developed. The block-lower-triangular interactor matrix is introduced to form a new method that is able to determine the performance benchmark based on controlled variable (CV) priorities coming from the LP results.
机译:模型预测控制(MPC)是过程工业中广泛使用的高级过程控制技术。根据内部模型原理,MPC的内部模型必须同时包括精确的工厂模型和扰动模型才能达到最佳。但是,实际上,MPC通常采用阶梯状干扰或固定干扰模型。结果,当扰动缓慢变化时,MPC将不是最佳的。此外,它还缺乏一种基于MPC模型来评估控制性能最优性的工具。本论文提出了一种新的MPC扰动自适应方法。从单输入单输出(SISO)半导体制造工艺开始,我们用自适应EWMA控制器代替了常规的运行到运行控制器。结果表明,通过调整干扰模型可以补偿工厂模型的不匹配。分析表明自适应控制器稳定且收敛于最优控制器。该方法被扩展到多输入多输出(MIMO)系统。为了便于实际应用,建议使用阶数为(1,1)的集成移动平均(IMA)模型。已经建立了IMP(1,1)参数与商用MPC中的预测误差滤波器常数之间的等价关系。说明了干扰自适应的实现。它着重于非参数干扰模型的闭环识别。该方法在从观测者马尔可夫参数转换为系统马尔可夫参数的过程中结合了工厂模型信息。然后提出了一种新的评估MPC模型质量的控制性能评估方法。介绍了反馈不变原理,并在此基础上给出了估计干扰创新的方法。制定了模型质量指标作为性能基准,将预测误差与干扰创新进行了比较。结果表明,模型质量指标与MPC性能指标有关。大多数工业过程是通过MPC之上的线性规划(LP)问题进行优化的。提出了一种级联LP-MPC系统的控制性能监测新方法。引入块下三角交互器矩阵以形成一种新方法,该方法能够基于来自LP结果的受控变量(CV)优先级来确定性能基准。

著录项

  • 作者

    Sun, Zhijie.;

  • 作者单位

    University of Southern California.;

  • 授予单位 University of Southern California.;
  • 学科 Engineering Chemical.
  • 学位 Ph.D.
  • 年度 2012
  • 页码 153 p.
  • 总页数 153
  • 原文格式 PDF
  • 正文语种 eng
  • 中图分类
  • 关键词

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