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Nanomechanical properties and buckling instability of plasma induced damaged layers on polystyrene.

机译:等离子体诱发聚苯乙烯上受损层的纳米力学性能和屈曲不稳定性。

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摘要

In this thesis we report on an investigation of an elastic buckling instability as a driving force for the roughening of polystyrene, a model resist, during Ar+ plasma etching. Polystyrene films etched by pure Ar + plasma with different ion energies were characterized using both atomic force microscopy topography and force curve measurements. By using height-height correlation function in analyzing the AFM measured topography images, we find that surface corrugation of etched polystyrene film surfaces all display a dominant wrinkle wavelength (lambda), which is a function of ion energy. Next, we characterized the mechanical properties of these samples using AFM force curve measurements in an controlled ambient environment. We analyzed the measured force curves using a systematic algorithm based on statistical fitting procedures, and taking into account the adhesive interaction, in order to determine the effective elastic modulus of the films. We find that the effective elastic modulus (EBL) of the etched samples increases monotonically with increasing ion energy, but the changes are rather subtle as compared to the elastic modulus (EPS) of the unetched one.;In order to test the validity of a buckling instability as the mechanism for surface roughening in our polystyrene-Ar plasma system, the elastic modulus of individual layer (i.e. ion-damaged layer plus unmodified foundation) needs to be determined. We present a determination of the damaged layer elastic modulus (EDL) from the effective elastic modulus of the damaged layer/polystyrene bilayer structure (EBL), based upon a finite element method simulation taking into account the thickness and elastic modulus of the damaged layers. We extract the damaged layer elastic modulus versus etching ion energy initially within the approximation of a spherical tip in contact with a flat sample surface. We next extend our model, by considering a periodic corrugated film surface, with its amplitude and wavelength determined by AFM, to take into account the effect of roughness induced by plasma exposure. The damaged layer elastic modulus extracted from these two approximations gives of quantitative agreement, and thus evidence for the correlation between buckling instability and plasma-induced roughening.
机译:在这篇论文中,我们报道了对弹性屈曲不稳定性的研究,该不稳定性是作为Ar +等离子体蚀刻过程中聚苯乙烯(模型抗蚀剂)的粗糙化驱动力。使用原子力显微镜形貌和力曲线测量,对由纯Ar +等离子体以不同离子能量蚀刻的聚苯乙烯薄膜进行了表征。通过使用高度-高度相关函数分析AFM测量的地形图像,我们发现蚀刻的聚苯乙烯薄膜表面的表面波纹都显示出主要的褶皱波长(λ),这是离子能量的函数。接下来,我们在受控环境中使用AFM力曲线测量来表征这些样品的机械性能。我们使用基于统计拟合程序的系统算法分析了测得的力曲线,并考虑了粘合剂之间的相互作用,以确定薄膜的有效弹性模量。我们发现,经蚀刻的样品的有效弹性模量(EBL)随着离子能量的增加而单调增加,但与未蚀刻的样品的弹性模量(EPS)相比,其变化相当微妙。屈曲不稳定性作为我们的聚苯乙烯-氩等离子体系统中表面粗糙化的机制,需要确定各个层(即离子损伤层加未改性的基础)的弹性模量。我们基于有限层方法模拟,考虑了受损层的厚度和弹性模量,从受损层/聚苯乙烯双层结构(EBL)的有效弹性模量中确定了受损层的弹性模量(EDL)。我们首先在与平坦样品表面接触的球形尖端的近似范围内提取受损层的弹性模量与蚀刻离子能量的关系。接下来,我们通过考虑周期性波纹膜表面(其振幅和波长由AFM确定)来扩展模型,以考虑等离子体暴露引起的粗糙度影响。从这两个近似中提取的损伤层弹性模量给出了定量一致性,因此证明了屈曲不稳定性与等离子体诱导的粗糙化之间的相关性。

著录项

  • 作者

    Lin, Tsung-Cheng.;

  • 作者单位

    University of Maryland, College Park.;

  • 授予单位 University of Maryland, College Park.;
  • 学科 Engineering Materials Science.;Nanoscience.;Nanotechnology.
  • 学位 Ph.D.
  • 年度 2012
  • 页码 219 p.
  • 总页数 219
  • 原文格式 PDF
  • 正文语种 eng
  • 中图分类
  • 关键词

  • 入库时间 2022-08-17 11:43:47

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