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Thermal Conductivity of Polycrystalline Semiconductors and Ceramics.

机译:多晶半导体和陶瓷的导热系数。

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摘要

In the solar energy, thermoelectric, and solid-state laser industries, polycrystalline semiconductors and ceramics have been widely researched and applied to integrated devices. While the thermal conductivity (k ) of single crystals has been well-studied, k of polycrystalline materials is attracting more attention because it varies a lot with different processing techniques, alloying, impurities, porosity, and microstructures. As nanotechnology causes an evolution in the state of the art materials, researchers are also becoming interested in using nanostructuring to engineer properties including k in these materials with nano-scale grains.;This thesis investigates the thermal conductivity of some representative bulk polycrystalline semiconductors (Si, Si1-xGex, and Mg2Si1-xGex) and ceramics (Al2O 3 and AlN) used for different applications. The samples are made by collaborators using a current activated, pressure assisted densification (CAPAD) method. The k of these samples is measured by the 3ω method and analyzed using kinetic theory and Matthiessen's rule. For pure Si, the importance of grain size and pores on k is emphasized. A revised frequency-dependent (non-gray) model is proposed to better describe the phonon scattering mechanism at grain boundaries. For Si1-xGe x, the impact of homogeneity on k is observed. For Mg2Si1-xGex, the combined effects of alloy scattering and grain boundary scattering are discussed because they can potentially benefit the search for high efficiency thermoelectric devices. For Al 2O3 and AlN, the method of preparation of powers and additives are observed to have profound effect on k, due to segregation at grain boundaries, and this can be tuned to give much better thermal performance for high power laser applications as compared to current Nd:YAG based devices.
机译:在太阳能,热电和固态激光器行业中,多晶半导体和陶瓷已被广泛研究并应用于集成器件。尽管已经对单晶的导热系数(k)进行了深入研究,但多晶材料的k吸引了更多关注,因为它随不同的加工技术,合金化,杂质,孔隙率和微结构而变化很大。由于纳米技术导致了最先进材料的发展,研究人员也开始对使用纳米结构来设计具有纳米级晶粒的材料中包括k的特性感兴趣。;本论文研究了一些代表性的块状多晶半导体(Si ,Si1-xGex和Mg2Si1-xGex)以及用于不同应用的陶瓷(Al2O 3和AlN)。样品由合作者使用电流激活的压力辅助致密化(CAPAD)方法制备。这些样品的k用3ω方法测量,并使用动力学理论和Matthiessen法则进行分析。对于纯Si,强调了晶粒尺寸和孔对k的重要性。提出了一种修正的频率相关(非灰色)模型,以更好地描述晶界处的声子散射机理。对于Si1-xGe x,观察到均匀性对k的影响。对于Mg2Si1-xGex,讨论了合金散射和晶界散射的组合效应,因为它们可能有益于寻找高效热电器件。对于Al 2O3和AlN,观察到制备功率和添加剂的方法由于在晶界处的偏析而对k产生了深远的影响,与当前相比,可以对其进行调整以为大功率激光应用提供更好的热性能。 Nd:基于YAG的设备。

著录项

  • 作者

    Wang, Zhaojie.;

  • 作者单位

    University of California, Riverside.;

  • 授予单位 University of California, Riverside.;
  • 学科 Engineering Mechanical.;Engineering Materials Science.
  • 学位 Ph.D.
  • 年度 2012
  • 页码 106 p.
  • 总页数 106
  • 原文格式 PDF
  • 正文语种 eng
  • 中图分类
  • 关键词

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