首页> 外文学位 >A novel fabrication technique for three-dimensional nanostructures.
【24h】

A novel fabrication technique for three-dimensional nanostructures.

机译:三维纳米结构的新型制造技术。

获取原文
获取原文并翻译 | 示例

摘要

Three dimensional micro- and nano-structures are commonly used in the field of Photonics, Optoelectronics, Sensors and Biological applications. Although numerous physical models are developed, a major challenge has been in their fabrication which is commonly limited to conventional layer-by-layer techniques. In this dissertation, a novel method for fabricating three dimensional structures using Electron Beam Lithography (EBL) will be presented.;Electron Beam Lithography is one of the most important tools used in the field of micro- and nano-fabrication. Ultra high resolution (< 10 nm), ability to pattern without the use of a mask, versatility and large intrinsic depth of focus are its primary advantages. Large depth of focus provides the capability to pattern thick layers of resist. This feature of EBL coupled with the deposition of multiple layers of resist has led to the ability to fabricate three dimensional structures. A thorough review of EBL, the proposed Multi-Layer Direct Write technique and other issues related to fabrication of three dimensional structures will be presented.;Resists are films sensitive to electromagnetic radiation dispersed in suitable solvents. Currently, resists are deposited on wafers using the process of spin-coating. Consecutive spin coating of resists requires the use of compatible solvents to prevent unwanted dissolution. Hansen Solubility Parameters (HSP) were used to determine compatible solvents and resist polymers were recast into them. Detailed solubility analysis of all commercially available electron beam resists is also presented. Other issues related to depositing multiple layers of resist are also discussed.;Polymeric three dimensional structures exposed to electron beam radiation have limited structural strength and during the process of development, fluid interaction with structures causes deformation. This has been observed in some cases of free standing nanostructures and Finite Element Modeling was employed to determine its bounds. Different models illustrating fluid flow and its interaction with structures will presented and compared to experimental observations.
机译:三维微结构和纳米结构通常用于光子学,光电子学,传感器和生物应用领域。尽管开发了许多物理模型,但是它们的制造一直是主要的挑战,通常仅限于常规的逐层技术。本文提出了一种利用电子束光刻技术制备三维结构的新方法。电子束光刻技术是微细加工和纳米加工领域最重要的工具之一。它的主要优势是超高分辨率(<10 nm),无需使用掩模即可形成图案的功能,多功能性和较大的固有聚焦深度。大的聚焦深度提供了对抗蚀剂厚层进行构图的功能。 EBL的这一特征与多层抗蚀剂的沉积相结合,已导致制造三维结构的能力。将对EBL进行全面的回顾,提出拟议的多层直接写入技术以及与三维结构制造有关的其他问题。抗蚀剂是对分散在合适溶剂中的电磁辐射敏感的薄膜。当前,使用旋涂工艺将抗蚀剂沉积在晶片上。连续旋涂抗蚀剂需要使用相容的溶剂,以防止不必要的溶解。使用汉森溶解度参数(HSP)来确定兼容的溶剂,并将抗蚀剂聚合物重铸到其中。还介绍了所有市售电子束抗蚀剂的详细溶解度分析。还讨论了与沉积多层抗蚀剂有关的其他问题。暴露于电子束辐射的聚合物三维结构的结构强度有限,并且在显影过程中,与结构的流体相互作用会导致变形。在某些独立的纳米结构中,已经观察到了这一点,并采用了有限元模型来确定其边界。将展示说明流体流动及其与结构的相互作用的不同模型,并将其与实验观察结果进行比较。

著录项

  • 作者

    Bonam, Ravi Kiran.;

  • 作者单位

    State University of New York at Albany.;

  • 授予单位 State University of New York at Albany.;
  • 学科 Nanoscience.;Chemistry Polymer.;Engineering Materials Science.
  • 学位 Ph.D.
  • 年度 2012
  • 页码 254 p.
  • 总页数 254
  • 原文格式 PDF
  • 正文语种 eng
  • 中图分类
  • 关键词

相似文献

  • 外文文献
  • 中文文献
  • 专利
获取原文

客服邮箱:kefu@zhangqiaokeyan.com

京公网安备:11010802029741号 ICP备案号:京ICP备15016152号-6 六维联合信息科技 (北京) 有限公司©版权所有
  • 客服微信

  • 服务号