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Novel properties of magnetic epitaxial films of cobalt, manganese and germanium ternary system.

机译:钴,锰和锗三元系磁性外​​延膜的新颖性质。

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摘要

Magnetic epitaxial films that contain Co, Mn, and Ge have been grown on two orientations of Ge substrates, (111) and (001), and studied using combinatorial molecular beam epitaxy techniques. Epitaxial growth of CoxMn yGel1-x-y on Ge (111) substrates has been stabilized over nearly the entire composition range of the ternary system. Within a narrow region of compositions along a relative concentration ratio between Co and Mn of 2 and between Ge concentrations of 20 and 50%, highly ordered face-center-cubic structures with Curie temperatures 400K have been discovered, including the Heusler compound of Co2MnGe but the most ordered structure is shifted to (Co2/3Mn1/3)0.7Ge0.3. This is attributed to effects of epitaxial constraints. For growth on Ge (001) substrates we have shown that complementary doping into Ge (001) using two transition metal dopants, Mn and Co with larger and smaller atomic radii to compensate the effects of lattice strain can stabilize high quality epitaxial growth at high doping levels. The magnetic and transport properties of the co-doped Ge exhibit p-type semiconductivity, high TC and large magnetoresistance effects. The maximum TC achieved in the semiconducting materials is ∼300K.
机译:包含Co,Mn和Ge的磁性外延膜已在Ge衬底的两个方向(111)和(001)上生长,并使用组合分子束外延技术进行了研究。在Ge(111)衬底上CoxMn yGel1-x-y的外延生长在三元体系的几乎整个组成范围内都已稳定。在沿Co和Mn的相对浓度比为2且Ge浓度为20%至50%的相对浓度比的狭窄区域内,已发现居里温度 400K的高度有序的面心立方结构,其中包括Heusler化合物。 Co2MnGe,但最有序的结构转移到(Co2 / 3Mn1 / 3)0.7Ge0.3。这归因于外延约束的影响。对于在Ge(001)衬底上生长,我们已经表明,使用两种过渡金属掺杂剂Mn和Co的原子半径越来越大,以补偿晶格应变的影响,可以互补掺杂到Ge(001)中,从而可以在高掺杂时稳定高质量的外延生长水平。共掺杂Ge的磁学和输运性质表现出p型半导体性,高TC和大磁阻效应。在半导体材料中获得的最大TC为〜300K。

著录项

  • 作者

    He, Liang.;

  • 作者单位

    The University of North Carolina at Chapel Hill.;

  • 授予单位 The University of North Carolina at Chapel Hill.;
  • 学科 Physics Condensed Matter.; Engineering Materials Science.
  • 学位 Ph.D.
  • 年度 2005
  • 页码 108 p.
  • 总页数 108
  • 原文格式 PDF
  • 正文语种 eng
  • 中图分类 工程材料学;
  • 关键词

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