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Near Zero Sub-threshold Swing Nano-Electro-Mechanical Field Effect Transistor with Suspended Germanium/Silicon Core/Shell Nanowire Channel.

机译:带有悬浮的锗/硅芯/壳纳米线通道的接近零亚阈值摆幅的纳米机电磁场效应晶体管。

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摘要

The static power consumption became one of the key limiting factors on the shrinkage of feature size of VLSI circuit using CMOS technology. One major reason of high static power consumption is the off-state sub-threshold leakage current of the transistor. At room temperature, the possible steepest sub-threshold swing (SS) for turning off the transistor, is limited to 60 mV/decade due to a constant fundamental thermal dynamical limit (kB T/q) that is not scalable with reduced dimension. This limitation is inherent to CMOS because its off-state is governed by thermally activated diffusive current over a potential gate-controlled potential barrier. Completely different switching mechanism such as using the mechanical degree of freedom is necessary to break the SS limit. Previous studies using nano-electro-mechanical-system (NEMS) have shown suspended-gate MOSFET (SG-MOSFET) as logical switch, while we have previously proposed a suspended nanowire (NW) channel FET (NEMFET) with low pull-in voltage(Vpi) and high Ion/Ioff ratio due to the flexibility of nanowires. Here we report the first demonstration of a NEMFET device using suspended Ge/Si core/shell nanowire channel. The NEMFET channel is suspended over a local metal gate with the air gap thickness defined by the thickness of the supporting source/drain electrodes. DC transfer characteristics on multiple switching NEMFET demonstrates close-to-zero SS (<6mV) at room temperature with the slope only limited by measurement equipment resolution. Furthermore, we employed electrostatic actuation to study the AC mechanical response of the nanowire channel. Using the NEMFET as a signal mixer we characterized the resonant frequency and the speed of NEMFET device to be 125.9 MHz.
机译:静态功耗成为限制采用CMOS技术的VLSI电路的特征尺寸缩小的关键限制因素之一。静态功耗高的一个主要原因是晶体管的截止状态亚阈值泄漏电流。在室温下,由于恒定的基本热力学极限(kB T / q)不能随尺寸减小而缩放,因此用于关断晶体管的可能的最陡峭的亚阈值摆幅(SS)被限制为60 mV /十倍。此限制是CMOS固有的,因为它的截止状态由电位控制的势垒上的热激活扩散电流控制。完全不同的开关机制(例如使用机械自由度)对于打破SS极限是必要的。先前使用纳米机电系统(NEMS)进行的研究表明,悬浮栅MOSFET(SG-MOSFET)作为逻辑开关,而我们先前已经提出了具有低吸合电压的悬浮纳米线(NW)沟道FET(NEMFET) (Vpi)和高离子/ Ioff比,归因于纳米线的柔韧性。在这里,我们报告使用悬浮的Ge / Si核/壳纳米线通道的NEMFET器件的首次演示。 NEMFET通道悬挂在局部金属栅极上,气隙厚度由支撑源极/漏极的厚度确定。多重开关NEMFET上的直流传输特性表明,室温下的SS接近零(<6mV),其斜率仅受测量设备分辨率的限制。此外,我们采用静电致动来研究纳米线通道的交流机械响应。使用NEMFET作为信号混频器,我们将NEMFET器件的谐振频率和速度定为125.9 MHz。

著录项

  • 作者

    Kim, Ji Hun.;

  • 作者单位

    University of California, San Diego.;

  • 授予单位 University of California, San Diego.;
  • 学科 Engineering Electronics and Electrical.
  • 学位 Ph.D.
  • 年度 2013
  • 页码 116 p.
  • 总页数 116
  • 原文格式 PDF
  • 正文语种 eng
  • 中图分类
  • 关键词

  • 入库时间 2022-08-17 11:41:37

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