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Interferometric porosimetry of porous silicon with radius distribution functions.

机译:具有半径分布函数的多孔硅的干涉孔隙率法。

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摘要

In this study a set of porous silicon (pSi) interferometric vapor sensor were made from p+ (~1 O-cm) and p++ (~0.005 O-cm) B-doped Si. The pSi layers were prepared electrochemically, stabilized either by ozone oxidation or 1-octene derivatization, and then characterized. FTIR reflection spectroscopy, scanning electron microscopy, and x-ray spectroscopy of pSi layer cross sections confirmed the completeness of the ozone oxidation and 1-octene hydrosilation. The performance of the pSi layers as interferometric ethanol vapor sensors was assessed by constructing calibration curves of optical thickness change versus ethanol partial pressure and using these to assess the detection limits for ethanol vapor sensing. The interferometric calibration curves were analyzed by fitting them to a BET adsorption and capillary condensation model. The model fits the calibration curves using four parameters: two thermodynamic parameters describing physisorption, plus a mean radius and standard deviation describing the pore size distribution. Acceptable fits were obtained for the p+ Si only, and these fits yielded reasonable mean radii that clearly contracted in response to the octene hydrosilation.
机译:在这项研究中,一组多孔硅(pSi)干涉式蒸汽传感器由p +(〜1 O-cm)和p ++(〜0.005 O-cm)的B掺杂硅制成。 pSi层是通过电化学方法制备的,可通过臭氧氧化或1-辛烯衍生化使其稳定,然后进行表征。 pSi层截面的FTIR反射光谱,扫描电子显微镜和X射线光谱证实了臭氧氧化和1-辛烯硅氢化反应的完成。通过构建光学厚度变化与乙醇分压的校准曲线,并使用这些曲线评估乙醇蒸气感测的检测极限,可以评估pSi层作为干涉式乙醇蒸气传感器的性能。通过将干涉仪校准曲线拟合到BET吸附和毛细管冷凝模型来进行分析。该模型使用四个参数拟合校准曲线:两个描述物理吸附的热力学参数,以及描述孔径分布的平均半径和标准偏差。仅对p + Si获得了可接受的拟合,并且这些拟合产生了合理的平均半径,该平均半径响应于辛烯硅氢化反应而明显收缩。

著录项

  • 作者

    Lu, Yu-Chun.;

  • 作者单位

    San Jose State University.;

  • 授予单位 San Jose State University.;
  • 学科 Chemistry Analytical.;Chemistry Physical.
  • 学位 M.S.
  • 年度 2010
  • 页码 74 p.
  • 总页数 74
  • 原文格式 PDF
  • 正文语种 eng
  • 中图分类
  • 关键词

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