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Far-field superlens for optical imaging beyond diffraction limit and other nano-plasmonic devices.

机译:远场超透镜,用于超出衍射极限和其他纳米等离子体设备的光学成像。

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摘要

The resolution of far-field optical lenses is fundamentally limited by diffraction which typically is about half wavelength. To overcome this resolution limit and boost the optical microscope applications in nanoscale, I proposed a new optical imaging principle using a so called far-field superlens (FSL) which comprises a slab of silver superlens and a subwavelength grating. By placing the FSL in the vicinity of the object, the evanescent waves from the object can be greatly enhanced by excitation of surface plasmons (SPs) in the silver slab and then converted into propagating waves by the grating. Based on the well designed optical transfer function (OTF) of the FSL, the evanescent waves are able to be retrieved from the propagating waves detection in the far-field. The required OTF and how to realize it in practice was discussed in detail. The final image with subwavelength resolution was reconstructed with the help of a numerical procedure. The designed OTF of the FSL which is the foundation of the FSL has been experimentally proved. Preliminary reconstruction results has revealed that the current designed silver structured FSL has the ability to image feature size down to 50nm using 377nm illumination light. This study opens up a new opportunity for subwavelength real time optical imaging and may lead to many exciting applications in nano-optics, electronics manufacturing and biological imaging.; Several of other nano-plasmonic devices have also been investigated. SP interference was applied to nanolithography. Utilizing exactly the same conditions as conventional photolithography (i-line), high resolution lithography results (∼60nm feature) with various patterns have been demonstrated by both numerical simulation and experiments. A plasmonic lens which comprises circular slit/slits in a metallic film has also been extensively studied. The detailed lens concept, lens properties and performance, and potential applications were presented.
机译:远场光学透镜的分辨率基本上受到衍射的限制,衍射通常约为一半波长。为了克服此分辨率极限并提高光学显微镜在纳米级的应用,我提出了一种新的光学成像原理,该原理使用了所谓的远场超透镜(FSL),该透镜包括一块银超透镜和一个亚波长光栅。通过将FSL放置在物体附近,可以通过激发银平板中的表面等离激元(SP)来大大增强来自物体的waves逝波,然后通过光栅将其转换为传播波。基于FSL精心设计的光学传递函数(OTF),能够从远场的传播波检测中检索到van逝波。详细讨论了所需的OTF及其在实践中的实现方式。借助数值程序重建了具有亚波长分辨率的最终图像。作为FSL基础的FSL的设计OTF已通过实验证明。初步的重建结果表明,当前设计的银结构FSL具有使用377nm照明光将特征尺寸减小到50nm的能力。这项研究为亚波长实时光学成像开辟了新的机会,并可能导致在纳米光学,电子制造和生物成像领域的许多激动人心的应用。还研究了几种其他的纳米等离子体装置。 SP干涉被应用于纳米光刻。利用与传统光刻技术(i-line)完全相同的条件,通过数值模拟和实验都证明了具有各种图案的高分辨率光刻结果(约60nm特征)。还已经广泛研究了在金属膜中包括圆形狭缝的等离子透镜。介绍了详细的镜头概念,镜头特性和性能以及潜在的应用。

著录项

  • 作者

    Liu, Zhaowei.;

  • 作者单位

    University of California, Los Angeles.;

  • 授予单位 University of California, Los Angeles.;
  • 学科 Engineering Mechanical.; Physics Optics.
  • 学位 Ph.D.
  • 年度 2006
  • 页码 189 p.
  • 总页数 189
  • 原文格式 PDF
  • 正文语种 eng
  • 中图分类 机械、仪表工业;光学;
  • 关键词

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