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Material characterization, patterning and adsorbate induced modulation of light emission of porous silicon produced by metal-assisted electroless etching.

机译:通过金属辅助化学蚀刻产生的多孔硅的材料表征,图案化和吸附物诱导的光调制。

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Metal-assisted electroless etching of Pt-patterned Si in HF, H2 O2 and methanol produces photoluminescent porous silicon (PSi). Upon ultraviolet excitation, the peak emission wavelength of PSi can be tuned in the visible spectral range simply by varying the etching conditions. Photoluminescence measurements reveal the spectral and spatial characteristics of the light emission as a function of processing parameters, while scanning electron microscopy reveals nanocrystalline features in the region where the luminescence originates. Raman scattering measurements of the shift and broadening of the longitudinal optical phonon band, interpreted in the context of the phonon confinement model, are used to estimate crystallite sizes in an attempt to correlate evolution of morphology with light emission. The results point to proximity to a deposited metal feature as a determining factor in the development of the morphology and light emission characteristics. Based on these observations, creation of photoluminescent pixel arrays in the micron and sub-micron dimension is explored by coupling of small area Pt deposition with metal-assisted electroless etching. Electroless etching produces photoluminescent PSi pixel arrays with high fidelity transfer of the Pt pattern obtained by focused ion beam assisted deposition from an organometallic precursor, trimethylmethylcyclopentadienyl platinum. The morphologies of the etched structure obtained are an admixture of porous areas coexisting with deeper heavily etched crater regions. Correlation of the morphology with the luminescence characteristics reveals that only the porous areas emit while the deeper crater areas remain dark. Development of such patterning protocols in addition to the ease of fabrication and large internal surface make PSi produced by metal-assisted electroless etching, attractive for sensing applications. However, understanding of the material behavior in different media is necessary prior to successful implementation of such interests. With this goal, a study of the chemistry and photoluminescence behavior of PSi in aqueous solutions of ionic surfactants is undertaken by photoluminescence and Fourier Transform Infrared (FTIR) spectroscopy. Modulation of the light emission of PSi in surfactant solutions can be interpreted by changes in the depletion region of the semiconductor as a result of adsorption of cationic and anionic surfactants.
机译:在HF,H2 O2和甲醇中对Pt图案化的Si进行金属辅助的化学镀可产生光致发光多孔硅(PSi)。在紫外线激发下,只需改变蚀刻条件即可在可见光谱范围内调整PSi的峰值发射波长。光致发光测量揭示了发光的光谱和空间特征,其是加工参数的函数,而扫描电子显微镜揭示了发光起源区域的纳米晶体特征。在声子限制模型的上下文中解释了纵向光学声子带的位移和展宽的拉曼散射测量,用于估计微晶尺寸,以试图将形态演化与发光相关联。结果表明,与沉积的金属特征的接近程度是形成形态和发光特性的决定因素。基于这些观察,通过将小面积的Pt沉积与金属辅助的化学蚀刻相结合,探索了微米和亚微米尺寸的光致发光像素阵列的创建。化学蚀刻产生具有高保真度的Pt图案的光致发光PSi像素阵列,该Pt图案是通过聚焦离子束辅助沉积从有机金属前体三甲基甲基环戊二烯基铂获得的。所获得的蚀刻结构的形态是与较深的严重蚀刻的坑口区域共存的多孔区域的混合物。形态与发光特性的相关性揭示出仅多孔区域发射,而较深的火山口区域保持黑暗。除了易于制造和较大的内表面之外,这种图案化协议的发展还使得通过金属辅助化学蚀刻生产的PSi吸引了传感应用。但是,在成功实现这些利益之前,必须了解不同媒体中的物质行为。为此,通过光致发光和傅里叶变换红外(FTIR)光谱研究了离子表面活性剂水溶液中PSi的化学和光致发光行为。表面活性剂溶液中PSi发光的调节可以通过阳离子和阴离子表面活性剂吸附导致的半导体耗尽区的变化来解释。

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