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Gas-phase photofragmentation and multiphoton ionization of transition metal and lanthanide coordination compounds.

机译:过渡金属和镧系元素配位化合物的气相光碎裂和多光子电离。

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摘要

The gas-phase photofragmentation of metal-containing compounds is relevant to photo-assisted chemical vapor deposition (CVD). Understanding and manipulation of photochemical processes that occur during deposition allow for greater control of the overall process. This dissertation reports on the photofragmentation and photoionization of gaseous metal-organic compounds, studied via time-of-flight mass spectrometry, resonance-enhanced multiphoton ionization, and gas-phase luminescence.;Traditional compounds studied are organometallic compounds, including transition metal alkyls and metallocenes. Photoexcitation results in extensive fragmentation: the metal cation is the heaviest and dominant species formed. Photons cleave all metal-ligand bonds before the parent molecule can ionize. The parent ion and smaller metal-containing species are not detected. Intramolecular rearrangements do not occur while ligands remain attached to the metal. This dissertation suggests otherwise: the parent ion can be generated in significant amounts and ligands readily undergo reactions while coordinated.;The dissertation discusses several metal-organic species, including transition metal, main group, and lanthanide compounds. The observed photoproducts are interpreted in terms of the parent molecules' potential as photo-assisted CVD precursors. A series of lanthanide-organic beta-diketonate compounds forms high amounts of Ln+ and LnO+ which can serve as dopants in semiconducting thin metal films. A nickel (II) beta-diketonate compound is found to generate strong yields of both Ni+ and NiF+. Although the presence of metal fluoride discourages the use of this compound as a CVD precursor, a rich amount of photochemistry is observed. NiF+ forms after an intramolecular rearrangement on the ligand, and unprecedented amine to imine formation occurs via multiple photoreaction processes. The rearrangements occur while ligands are still bound to nickel. Metal-amide compounds have the potential to serve as precursors for metal and metal nitride deposition. Excitation of a tin-containing silylamide compound in resonance with known atomic tin transitions cleanly produces Sn +; however, SnN+ is never detected. During UV excitation, Sn+ is a minor ion, as the parent ion and mass peaks containing fragments of coordinated ligand are mostly formed. A mixed-ligand platinum compound never produces Pt+ in a dominant yield. In contrast to the lanthanide series, metal oxide is never formed. However, the compound is yet another example where the photo fragmentation is wavelength-dependent.
机译:含金属化合物的气相光致碎裂与光辅助化学气相沉积(CVD)有关。对沉积过程中发生的光化学过程的理解和操作可以更好地控制整个过程。本文通过飞行时间质谱,共振增强多光子电离和气相发光研究了气态金属-有机化合物的光致碎裂和光电离。研究的传统化合物是有机金属化合物,包括过渡金属烷基和茂金属。光激发导致广泛的碎片化:金属阳离子是最重且占主导地位的物种。光子在母体分子离子化之前会裂解所有的金属-配体键。未检测到母离子和较小的含金属物质。当配体保持附着在金属上时,不会发生分子内重排。本文提出了另外一个建议:母体离子可以大量生成,配体在配位时易于发生反应。本文讨论了几种金属有机物,包括过渡金属,主族和镧系元素。观察到的光产物根据母体分子作为光辅助CVD前体的潜力来解释。一系列镧系-有机β-二酮化合物形成大量的Ln +和LnO +,可在半导体薄膜中用作掺杂剂。发现β-二酮镍(II)化合物可产生很高的Ni +和NiF +收率。尽管金属氟化物的存在阻碍了该化合物作为CVD前体的使用,但观察到了大量的光化学反应。 NiF +在配体上发生分子内重排后形成,并且通过多种光反应过程发生了前所未有的胺到亚胺的形成。当配体仍与镍结合时发生重排。金属酰胺化合物具有用作金属和金属氮化物沉积的前体的潜力。与已知的原子锡跃迁共振激发含锡甲硅烷基酰胺化合物可干净地产生Sn +;但是,永远不会检测到SnN +。在UV激发过程中,Sn +是次要离子,因为主要形成母离子和包含配位体片段的质量峰。混合配体的铂化合物永远不会以占优势的产率产生Pt +。与镧系元素相反,从未形成金属氧化物。然而,该化合物是其中光碎裂是波长依赖性的另一个例子。

著录项

  • 作者

    Ow, Franklin Pak-Ho.;

  • 作者单位

    University of California, Los Angeles.;

  • 授予单位 University of California, Los Angeles.;
  • 学科 Chemistry Inorganic.;Chemistry Physical.
  • 学位 Ph.D.
  • 年度 2007
  • 页码 181 p.
  • 总页数 181
  • 原文格式 PDF
  • 正文语种 eng
  • 中图分类
  • 关键词

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