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Investigation of magnetotransport properties in III-manganese-V ferromagnetic semiconductors.

机译:III-锰-V铁磁半导体中的磁输运性质研究。

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摘要

III-Mn-V ferromagnetic semiconductors---GaMnAs, InMnAs, InMnSb, and GaMnSb---are studied experimentally using electrical transport techniques, with emphasis on resistivity, anomalous Hall effect (AHE), anisotropic magnetoresistance (AMR), and planar Hall effect (PHE). All III-Mn-V samples were grown by low temperature molecular beam epitaxy (LT-MBE). The structures of the samples are as follows: (i) GaMnAs/GaAlAs heterostructures and GaAlAs/GaMnAs/GaAlAs quantum wells modulation-doped by Be atoms in GaAlAs layers; (ii) InMnAs grown on InAlAs/AlSb buffer layers; (iii) a new narrow-gap ferromagnetic semiconductor InMnSb grown on InSb/CdTe substrates; (iv) GaMnSb epilayers grown on ZnTe or GaSb buffer layers; (v) two structurally different forms of GaMnAs alloys (i.e., random and digital alloys); and (vi) GaMnAs films grown on vicinal GaAs substrates. Measurements of resistivity in III-Mn-V alloys serve to establish the Curie temperature, and to provide an indication of whether the specimen is metallic or insulating. Anomalous Hall effect measurements are used to establish the presence of ferromagnetic order and to investigate the scattering mechanisms (skew or sidejump) in III-Mn-V alloys.;The planar Hall effect (PHE), an effect stemming from anisotropic magnetoresistance, is used to investigate the transitions in orientation of the in-plane magnetization that accompany the process of magnetization reversal, in order to probe magneto-crystalline anisotropy, and to obtain insight into the effect of domain wall pinning on these transitions. The in-plane anisotropy fields determined via PHE provide compelling proof that the samples can be satisfactorily described by the Stoner-Wohlfarth single magnetic domain model.;A striking asymmetry is observed in magnetic field dependence of the planar Hall resistance in GaMnAs films grown on vicinal substrates, caused by the superposition of PHE and AHE. This asymmetry reflects the effect of magneto-crystalline anisotropy in GaMnAs, that confines the magnetization M to a preferred crystal plane rather than to the plane of the film, which in vicinal samples gives rise to a non-zero component of M normal to the sample plane. This asymmetry allows one to obtain four distinct zero-field resistance states in vicinal GaMnAs films that depend on the history of the experiment, making it of potential interest for building a unique four-state memory device.
机译:使用电传输技术对III-Mn-V铁磁半导体GaMnAs,InMnAs,InMnSb和GaMnSb进行了实验研究,重点研究了电阻率,反常霍尔效应(AHE),各向异性磁阻(AMR)和平面霍尔效果(PHE)。所有III-Mn-V样品均通过低温分子束外延(LT-MBE)生长。样品的结构如下:(i)GaAlAs层中的Be原子调制掺杂的GaMnAs / GaAlAs异质结构和GaAlAs / GaMnAs / GaAlAs量子阱; (ii)在InAlAs / AlSb缓冲层上生长的InMnAs; (iii)在InSb / CdTe衬底上生长的新型窄间隙铁磁半导体InMnSb; (iv)在ZnTe或GaSb缓冲层上生长的GaMnSb外延层; (v)两种结构不同形式的GaMnAs合金(即无规合金和数字合金); (vi)在邻近的GaAs衬底上生长的GaMnAs膜。对III-Mn-V合金的电阻率进行测量可确定居里温度,并提供样品是金属还是绝缘的指示。霍尔效应的异常测量用于确定铁磁序的存在并研究III-Mn-V合金中的散射机制(偏斜或侧跃);使用了平面霍尔效应(PHE),它是各向异性磁阻效应研究磁化反转过程中面内磁化方向的转变,以探测磁晶各向异性,并深入了解畴壁钉扎对这些转变的影响。通过PHE确定的面内各向异性场提供了令人信服的证据,证明了Stoner-Wohlfarth单磁畴模型可以令人满意地描述样品。;在邻近生长的GaMnAs膜中,在平面霍尔电阻的磁场依赖性方面观察到了惊人的不对称性底物,是由于PHE和AHE的重叠引起的。这种不对称性反映了GaMnAs中磁晶各向异性的影响,这将磁化强度M限制在优选的晶面而不是薄膜的平面上,这在相邻样品中产生了垂直于样品的M的非零分量。飞机。这种不对称性使得人们可以在邻近的GaMnAs薄膜中获得四个不同的零场电阻状态,这取决于实验的历史,这对于构建独特的四态存储器件具有潜在的意义。

著录项

  • 作者

    Lim, Weng-Lee.;

  • 作者单位

    University of Notre Dame.;

  • 授予单位 University of Notre Dame.;
  • 学科 Physics Condensed Matter.;Engineering Materials Science.
  • 学位 Ph.D.
  • 年度 2006
  • 页码 187 p.
  • 总页数 187
  • 原文格式 PDF
  • 正文语种 eng
  • 中图分类
  • 关键词

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