首页> 外文学位 >The effects of phosphate and silicate inhibitors on surface roughness and copper release in water distribution systems.
【24h】

The effects of phosphate and silicate inhibitors on surface roughness and copper release in water distribution systems.

机译:磷酸盐和硅酸盐抑制剂对配水系统表面粗糙度和铜释放的影响。

获取原文
获取原文并翻译 | 示例

摘要

The effects of corrosion inhibitors on water quality and the distribution system were studied. This dissertation investigates the effect of inhibitors on iron surface roughness, copper surface roughness, and copper release.;Corrosion inhibitors included blended poly/ortho phosphate, sodium orthophosphate, zinc orthophosphate, and sodium silicate. These inhibitors were added to a blend of surface water, groundwater, and desalinated brackish water.;Surface roughness of galvanized iron, unlined cast iron, lined cast iron, and polyvinyl chloride was measured using pipe coupons exposed for three months. Roughness of each pipe coupon was measured with an optical surface profiler before and after exposure to inhibitors. For most materials, inhibitor did not have a significant effect on surface roughness; instead, the most significant factor determining the final surface roughness was the initial surface roughness. Coupons with low initial surface roughness tended to have an increase in surface roughness during exposure, and vice versa, implying that surface roughness tended to regress towards an average or equilibrium value. For unlined cast iron, increased alkalinity and increased temperature tended to correspond with increases in surface roughness. Unlined cast iron coupons receiving phosphate inhibitors were more likely to have a significant change in surface roughness, suggesting that phosphate inhibitors affect stability of iron pipe scales.;Similar roughness data collected with new copper coupons showed that elevated orthophosphate, alkalinity, and temperature were all factors associated with increased copper surface roughness. The greatest increases in surface roughness were observed with copper coupons receiving phosphate inhibitors. Smaller increases were observed with copper coupons receiving silicate inhibitor or no inhibitor. With phosphate inhibitors, elevated temperature and alkalinity were associated with larger increases in surface roughness and blue-green copper (II) scales. Otherwise a compact, dull red copper (I) scale was observed. These data suggest that phosphate inhibitor addition corresponds with changes in surface morphology, and surface composition, including the oxidation state of copper solids.;The effects of corrosion inhibitors on copper surface chemistry and cuprosolvency were investigated. Most copper scales had X-ray photoelectron spectroscopy binding energies consistent with a mixture of Cu2O, CuO, Cu(OH) 2, and other copper (II) salts. Orthophosphate and silica were detected on copper surfaces exposed to each inhibitor.;All phosphate and silicate inhibitors reduced copper release relative to the no inhibitor treatments, keeping total copper below the 1.3 mg/L MCLG for all water quality blends. All three kinds of phosphate inhibitors, when added at 1 mg/L as P, corresponded with a 60% reduction in copper release relative to the no inhibitor control. On average, this percent reduction was consistent across varying water quality conditions in all four phases. Similarly when silicate inhibitor was added at 6 mg/L as SiO2, this corresponded with a 25-40% reduction in copper release relative to the no inhibitor control. Hence, on average, for the given inhibitors and doses, phosphate inhibitors provided more predictable control of copper release across changing water quality conditions. A plot of cupric ion concentration versus orthophosphate concentration showed a decrease in copper release consistent with mechanistic control by either cupric phosphate solubility or a diffusion limiting phosphate film.;Thermodynamic models were developed to identify feasible controlling solids. For the no inhibitor treatment, Cu(OH)2 provided the closest prediction of copper release. With phosphate inhibitors both Cu(OH)2 and Cu(PO4)·2H2O models provided plausible predictions. Similarly, with silicate inhibitor, the Cu(OH) 2 and CuSiO3 ˙H2O models provided plausible predictions.
机译:研究了缓蚀剂对水质和分配系统的影响。本文研究了缓蚀剂对铁表面粗糙度,铜表面粗糙度和铜释放的影响。缓蚀剂包括聚/正磷酸酯,正磷酸钠,正磷酸锌和硅酸钠。将这些抑制剂添加到地表水,地下水和淡化微咸水的混合物中。使用暴露了三个月的管道试件测量了镀锌铁,无衬里铸铁,衬里铸铁和聚氯乙烯的表面粗糙度。在暴露于抑制剂之前和之后,用光学表面轮廓仪测量每个试管的粗糙度。对于大多数材料,抑制剂对表面粗糙度没有显着影响。相反,决定最终表面粗糙度的最重要因素是初始表面粗糙度。具有低初始表面粗糙度的优惠券在曝光期间倾向于具有增加的表面粗糙度,反之亦然,这意味着表面粗糙度倾向于向平均值或平衡值回归。对于无衬里铸铁,碱度升高和温度升高往往与表面粗糙度的增加相对应。接受磷酸盐抑制剂的无衬里铸铁试样更可能具有明显的表面粗糙度变化,表明磷酸盐抑制剂会影响铁水垢的稳定性。新铜试样收集的相似粗糙度数据表明,正磷酸盐,碱度和温度均升高与铜表面粗糙度增加有关的因素。在使用磷酸盐抑制剂的铜试样上观察到表面粗糙度的最大增加。接受硅酸盐抑制剂或不使用抑制剂的铜试片观察到较小的增加。使用磷酸盐抑制剂时,温度和碱度升高与表面粗糙度和蓝绿色铜(II)垢的较大增加有关。否则,会观察到致密的暗红色铜(I)鳞片。这些数据表明磷酸盐抑制剂的添加与表面形态和表面组成的变化相对应,包括铜固体的氧化态。;研究了缓蚀剂对铜表面化学和铜溶解性的影响。大多数铜氧化皮的X射线光电子能谱结合能与Cu2O,CuO,Cu(OH)2和其他铜(II)盐的混合物一致。在暴露于每种抑制剂的铜表面上检测到正磷酸盐和二氧化硅。所有磷酸盐和硅酸盐抑制剂与无抑制剂处理相比,减少了铜的释放,所有水质混合物的总铜含量均低于1.3 mg / L MCLG。当以1 mg / L作为P加入所有三种磷酸盐抑制剂时,与无抑制剂对照相比,铜释放量减少了60%。平均而言,在所有四个阶段中,变化的水质状况在不同的水质条件下均保持不变。类似地,当以6 mg / L的形式添加SiO2作为硅酸盐抑制剂时,相对于无抑制剂对照,这相当于铜释放减少了25-40%。因此,平均而言,对于给定的抑制剂和剂量,磷酸盐抑制剂可在不断变化的水质条件下提供更可预测的铜释放控制。铜离子浓度对正磷酸盐浓度的曲线图表明,铜的释放减少与通过磷酸铜溶解度或扩散限制磷酸盐膜的机械控制相一致。;建立了热力学模型以识别可行的控制固体。对于无抑制剂处理,Cu(OH)2提供了最接近的铜释放预测。对于磷酸盐抑制剂,Cu(OH)2和Cu(PO4)·2H2O模型均提供了合理的预测。类似地,对于硅酸盐抑制剂,Cu(OH)2和CuSiO 3·H 2 O模型提供了合理的预测。

著录项

  • 作者

    MacNevin, David Earl.;

  • 作者单位

    University of Central Florida.;

  • 授予单位 University of Central Florida.;
  • 学科 Engineering Chemical.;Engineering Environmental.
  • 学位 Ph.D.
  • 年度 2007
  • 页码 154 p.
  • 总页数 154
  • 原文格式 PDF
  • 正文语种 eng
  • 中图分类
  • 关键词

相似文献

  • 外文文献
  • 中文文献
  • 专利
获取原文

客服邮箱:kefu@zhangqiaokeyan.com

京公网安备:11010802029741号 ICP备案号:京ICP备15016152号-6 六维联合信息科技 (北京) 有限公司©版权所有
  • 客服微信

  • 服务号