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Electrochemical nucleation and growth of copper and copper alloys.

机译:铜和铜合金的电化学成核和生长。

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摘要

This dissertation aims to contribute to a fundamental understanding of the physicochemical processes occurring in electrochemical nucleation and growth. To this end, the effects of various anions (chloride (Cl-), sulfate (SO42-) and sulfamate (NH2SO 3-)) on the electrochemical kinetics and the mechanism of copper reduction, as well as on the microstructure of the resulting films, were studied. On the basis of this work, the deposition of copper alloys (Cu-Ag with positive heat of mixing, Cu-Au with negative heat of mixing) was investigated with the main objective to achieve an insight on the role of solid state thermodynamics on the electrocrystallization process.;Chloride ions cause two competing effects: at low chloride concentration the formation of an adsorbed chloride layer introduces an additional reaction pathway, resulting in an overall depolarization of the reduction process with no significant change of the Tafel slope. At high chloride concentration, complexation phenomena induce a cathodic polarization of the deposition process and a decrease in the Tafel slope. Chlorides cause a decrease in the density and an increased size of copper nuclei. Sulfamate depolarizes copper reduction the most and results in the largest nucleus density.;Chloride promotes the faceting, and dendritic growth of copper deposits along 110> direction by introducing interfacial anisotropy.;Addition of Ag in the solution or in the electrode substrate enhances copper deposition and results in an additional reduction peak. Codeposition of Cu-Ag increases nucleus density and decreases nucleus size. Such enhancement of copper deposition, the increase in nucleus density and the decrease in nucleus size by Ag could be due to the continued formation of a surface alloy of Cu-Ag and the fast interface dynamics of Ag deposition.;Cu can be underpotentially codeposited in the Cu-Au alloy. Homogeneous solid solutions are grown under conditions of underpotential deposition of Cu, while precipitation of Cu-rich films is observed under Cu overpotential conditions. Indirect evidence for the formation of a Au3Cu L12 structure is observed. Nucleus density increases significantly with the addition of small amounts of gold in the solution, due to the negative heat of mixing decreasing the nucleation barrier.
机译:本论文旨在对电化学成核和生长过程中发生的物理化学过程有一个基本的了解。为此,各种阴离子(氯化物(Cl-),硫酸盐(SO42-)和氨基磺酸盐(NH2SO 3-))对电化学动力学和铜还原机理以及所得薄膜的微观结构的影响,进行了研究。在这项工作的基础上,研究了铜合金(具有正混合热的Cu-Ag,具有负混合热的Cu-Au)的沉积,其主要目的是了解固态热力学在合金中的作用。氯离子引起两个竞争效应:在低氯化物浓度下,吸附的氯化物层的形成引入了另外的反应途径,导致还原过程的整体去极化,而塔菲尔斜率没有明显变化。在高氯化物浓度下,络合现象会引起沉积过程的阴极极化并降低塔菲尔斜率。氯化物会导致密度降低和铜核尺寸增加。氨基磺酸盐使铜的还原作用最大程度地减少了极化作用,并导致最大的核密度。;氯化物通过引入界面各向异性促进了铜沉积物沿<110>方向的刻面生长和树枝状生长;在溶液或电极基材中添加Ag可以增强铜沉积并导致另外的还原峰。 Cu-Ag的共沉积可增加核密度并减小核尺寸。 Ag的这种铜沉积的增强,核密度的增加和核尺寸的减小可能是由于Cu-Ag表面合金的持续形成和Ag沉积的快速界面动力学所致。铜金合金。均相固溶体在铜的欠电位沉积条件下生长,而富铜膜的沉积在铜过电位条件下观察到。观察到形成Au3Cu L12结构的间接证据。随着溶液中少量金的加入,核的密度显着增加,这是由于混合的负热降低了成核屏障。

著录项

  • 作者

    Shao, Wenbo.;

  • 作者单位

    University of Virginia.;

  • 授予单位 University of Virginia.;
  • 学科 Engineering Materials Science.
  • 学位 Ph.D.
  • 年度 2008
  • 页码 233 p.
  • 总页数 233
  • 原文格式 PDF
  • 正文语种 eng
  • 中图分类 工程材料学;
  • 关键词

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