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Microstructural characterization in nanocrystalline ceramic thin films.

机译:纳米晶陶瓷薄膜的微观结构表征。

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摘要

The primary objective of this research is to investigate the effects of process variables on microstructure in several fluoride and oxide thin films prepared by vapor deposition, in order to predict the properties and behaviors of nanocrystalline thin film materials.;There are three distinct stages of this research. The first stage focuses on measuring of the porosity in polycrystalline thin films of a variety of fluorides as a function of the substrate temperature during deposition, and discussing the mechanism by which the porosity varies as a function of the process variables. We have measured the porosity in thin films of lithium fluoride (LiF), magnesium fluoride (MgF2), barium fluoride (BaF 2) and calcium fluoride (CaF2) using an atomic force microscope (AFM) and a quartz crystal thickness monitor. The porosity is very sensitive to the substrate temperature and decreases as the substrate temperature increases. Consistent behavior is observed among all of the materials in this study.;The second stage is to understand the film microstructure including grain growth and texture development, because these factors are known to influence the behavior and stability of polycrystalline thin films. This study focuses on grain growth and texture development in polycrystalline lithium fluoride thin films using dark field (DF) transmission electron microscopy (TEM). It is demonstrated that we can isolate the size distribution of 111> surface normal grains from the overall size distribution, based on simple and plausible assumptions about the texture. The {111} texture formation and surface morphology were also observed by x-ray diffraction (XRD) and AFM, respectively. The grain size distributions become clearly bimodal as the annealing time increases, and we deduce that the short-time size distributions are also a sum of two overlapping peaks. The smaller grain-size peak in the distribution corresponds to the {111}-oriented grains which do not grow significantly, while all other grains increase in size with annealing time. A novel feature of the LiF films is that the {111} texture component strengthens with annealing, despite the absence of growth for these grains, through the continued nucleation of new grains.;The third stage focuses on the evaluation of triple junction energy in nanocrystalline ZrO2 thin films. Grain boundaries and triple junctions are important aspects of the microstructure of most crystalline materials, and it is necessary to understand them to be able to predict the behavior of bulk polycrystals and polycrystalline thin films. Triple junctions, where three grains or grain boundaries meet, become increasingly important in nanocrystalline materials where they occupy an increasing fraction of the total volume of the material. It would therefore be of great significance to know whether, and if so how triple junction energy varies. In this study we evaluate triple junction energies in nanocrystalline ZrO2 thin films using thickness mapping images produced by energy filtered transmission electron microscopy (EFTEM), which enable us to measure the surface topography associated with grain boundaries and triple junctions. In our films, the triple junction energy is deduced to be either zero (within the accuracy of the measurement) for most, but significantly positive for a few of the junctions.
机译:这项研究的主要目的是研究工艺变量对气相沉积制备的几种氟化物和氧化物薄膜的微观结构的影响,从而预测纳米晶薄膜材料的性能和行为。研究。第一阶段着重于测量各种氟化物的多晶薄膜中的孔隙度,其与沉积过程中基板温度的关系,并讨论孔隙度随工艺变量而变化的机理。我们已经使用原子力显微镜(AFM)和石英晶体厚度监测仪测量了氟化锂(LiF),氟化镁(MgF2),氟化钡(BaF 2)和氟化钙(CaF2)薄膜的孔隙率。孔隙率对基板温度非常敏感,并且随着基板温度的升高而降低。本研究中所有材料之间观察到一致的行为。第二阶段是了解薄膜的微观结构,包括晶粒的生长和纹理的发展,因为已知这些因素会影响多晶薄膜的行为和稳定性。这项研究集中在使用暗场(DF)透射电子显微镜(TEM)的多晶氟化锂薄膜中晶粒生长和织构发展。事实证明,基于有关纹理的简单且合理的假设,我们可以从整体尺寸分布中分离出<111>表面法向晶粒的尺寸分布。还分别通过X射线衍射(XRD)和AFM观察到{111}织构的形成和表面形态。随着退火时间的增加,晶粒尺寸分布明显变为双峰态,我们推断出短时间尺寸分布也是两个重叠峰的总和。分布中较小的晶粒峰对应于没有显着生长的{111}取向晶粒,而所有其他晶粒的尺寸均随退火时间而增加。 LiF薄膜的一个新颖特征是,{111}的织构成分通过退火而增强,尽管这些晶粒没有生长,但仍通过新晶粒的持续成核而获得。;第三阶段着重于评估纳米晶体中的三重结能ZrO2薄膜。晶界和三重结是大多数晶体材料微观结构的重要方面,必须理解它们才能预测块状多晶和多晶薄膜的行为。三个结或三个晶界相遇的三重结在纳米晶材料中变得越来越重要,因为它们占据了材料总体积的一部分。因此,了解三重结能量是否以及如何变化非常重要。在这项研究中,我们使用能量过滤透射电子显微镜(EFTEM)产生的厚度图来评估纳米ZrO2薄膜中的三重结能,这使我们能够测量与晶界和三重结有关的表面形貌。在我们的影片中,三重结能量在大多数情况下被推定为零(在测量精度范围内),但对于少数结显着为正。

著录项

  • 作者

    Kim, Hakkwan.;

  • 作者单位

    Purdue University.;

  • 授予单位 Purdue University.;
  • 学科 Engineering Materials Science.
  • 学位 Ph.D.
  • 年度 2008
  • 页码 114 p.
  • 总页数 114
  • 原文格式 PDF
  • 正文语种 eng
  • 中图分类 工程材料学;
  • 关键词

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