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Review of characterization of ZnO by Spectroscopic Ellipsometry

机译:椭偏光谱法表征ZnO的研究进展

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摘要

Spectroscopic Ellipsometric (SE) is a non contact, non destructive optical characterization technique which allows the precise determination of the refractive indices and thicknesses of thin films. Very sensitive to any optical contrast, SE. is now also being applied to the characterization of organic materials such OLED or for a range of Solar Cells that require thin films; all parameters (complex refractive index and thickness) of each layer can be obtained from one single measurement.rnIn this paper we will focus on the determination of the thickness and refractive index of ZnO. We will also demonstrate how a SE measurement in different spectral range can give access to different properties of the ZnO & TCO's layers such as electrical properties (resistivity, resistance) or doping differentiation. We will introduce the SE measurement of encapsulated sample through the back side of the substrate and the extration film's resistivity.
机译:光谱椭偏仪(SE)是一种非接触,非破坏性的光学表征技术,可精确确定薄膜的折射率和厚度。 SE对任何光学对比度都非常敏感。现在也用于表征有机材料,例如OLED或需要薄膜的一系列太阳能电池;一次测量即可获得每一层的所有参数(复折射率和厚度)。本文将重点介绍ZnO的厚度和折射率的测定。我们还将演示在不同光谱范围内的SE测量如何能够访问ZnO和TCO层的不同特性,例如电特性(电阻率,电阻)或掺杂差异。我们将通过基板的背面和提取膜的电阻率介绍封装样品的SE测量。

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