Ion beam lithography preparation of the transparent conductive film of metal grating

摘要

Transparent conductive films of metal grating have been prepared by ion beam lithography method. The surface appearance and thickness of films were measured by atomic force microscope (AFM). Metal grating thickness uniformity has been improved to 2.34% when the flap was used to correction. Visible and near-infrared transparent have been measured by Lambda 900 spectrophotometer.