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Electron Paramagnetic Resonance Studies of Shallow Donors Behavior in Hydrogenated ZnO Films

机译:氢化ZnO薄膜中浅施主行为的电子顺磁共振研究

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摘要

Photoassisted metalorganic chemical vapor deposition (photo-MOCVD) technique was used for depositing of as-grown (ZnO) and hydrogenated (ZnO:H) zinc oxide polycrystalline thin films under different growth and hydrogen doping conditions. The structure and morphology of the films was controlled using SEM and AFM microscopy and surface roughness measurements. The studies of paramagnetic defects behavior and magnetic susceptibility in as-grown and hydrogenated samples were provided in the temperature range 77-300 K using X-band EPR spectrometer. It was found that all the samples exhibited a single symmetric strong Lorentzian line at g = 1.96 while the line intensity was shown to increase upon H-doping. The concentration of paramagnetic defects, associated with the concentration of the hydrogen donors, was extracted. The behavior of the magnetic susceptibility curves was described by Curie and Pauli contributions. We have shown that the excess concentration of paramagnetic defects, appeared after hydrogen doping, correlated with the increase of the Pauli term of magnetic susceptibility and followed the increase of free carrier concentration.
机译:采用光辅助金属有机化学气相沉积(photo-MOCVD)技术,在不同的生长和氢掺杂条件下沉积成膜的(ZnO)和氢化的(ZnO:H)氧化锌多晶薄膜。使用SEM和AFM显微镜以及表面粗糙度测量来控制膜的结构和形态。使用X波段EPR光谱仪在77-300 K的温度范围内研究了成长期和氢化样品中的顺磁缺陷行为和磁化率。发现所有样品在g = 1.96时均显示出单一对称的强洛伦兹线,而线强度显示出在H掺杂时增加。提取与氢供体浓度相关的顺磁缺陷浓度。居里和保利的贡献描述了磁化率曲线的行为。我们已经表明,氢掺杂后出现的顺磁缺陷的过量浓度与磁化率Pauli项的增加有关,并随自由载流子浓度的增加而增加。

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  • 会议地点 Vancouver(CA);Vancouver(CA)
  • 作者单位

    Department of Materials Science and Engineering, Korea Advanced Institute of Science and Technology, Yuseong, Daejeon 305-701, Republic of Korea,Solar Photovoltaic Laboratory, Semenov Institute of Chemical Physics RAS, Kosygin St. 4, 119334 Moscow, Russia;

    Solar Photovoltaic Laboratory, Semenov Institute of Chemical Physics RAS, Kosygin St. 4, 119334 Moscow, Russia;

    Department of Electrical Engineering and Computer Science, Korea Advanced Institute of Science and Technology, Yuseong, Daejeon 305-701, Republic of Korea;

    Department of Electrical Engineering and Computer Science, Korea Advanced Institute of Science and Technology, Yuseong, Daejeon 305-701, Republic of Korea;

    Solar Photovoltaic Laboratory, Semenov Institute of Chemical Physics RAS, Kosygin St. 4, 119334 Moscow, Russia;

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  • 正文语种 eng
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