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Constellation-X to Generation-X: Evolution of large collecting area, moderate resolution grazing incidence x-ray telescopes to larger area, high resolution, adjustable optics

机译:从星座X到X世代:大采集区域的演变,中等分辨率的掠入射X射线望远镜到更大的区域,高分辨率,可调节的光学元件

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Large collecting area x-ray telescopes are designed to study the early Universe, trace the evolution of black holes, stars and galaxies, study the chemical evolution of the Universe, and study matter in extreme environments. The Constellation-X mission (Con-X), planned for launch in 2016, will provide ~ 10~4 cm~2 collecting area with 15 arc-sec resolution, with a goal of 5 arc-sec. Future missions require larger collecting area and finer resolution. Generation-X (Gen-X), a NASA Visions Mission, will achieve 100 m~2 effective area at 1 keV and angular resolution of 0.1 arc-sec, half power diameter. We briefly describe the Con-X flowdown of imaging requirements to reflector figure error. To meet requirements beyond Con-X, Gen-X optics will be thinner and more accurately shaped than has ever been accomplished. To meet these challenging goals, we incorporate for the first time active figure control with grazing incidence optics. Piezoelectric material will be deposited in discrete cells directly on the back surface of the optical segments, with the strain directions oriented parallel to the surface. Differential strain between the two layers of the mirror causes localized bending in two directions, enabling local figure control. Adjusting figure on-orbit cases fabrication and metrology. The ability to make changes to mirror figure adds margin by mitigating risk due to launch-induced deformations and/or on-orbit degradation. We flowdown the Gen-X requirements to mirror figure and four telescope designs, and discuss various trades between the designs.
机译:大型收集区X射线望远镜旨在研究早期的宇宙,追踪黑洞,恒星和星系的演化,研究宇宙的化学演化以及研究极端环境中的物质。计划于2016年发射的Constellation-X任务(Con-X)将提供〜10〜4 cm〜2的收集区域,分辨率为15 arc-sec,目标为5 arc-sec。未来的任务需要更大的收集面积和更高的分辨率。 X世代(X世代)是NASA视觉任务,将在1 keV时实现100 m〜2的有效面积,角分辨率为0.1 arc-sec,半功率直径。我们简要描述了Con-X成像要求对反射镜图形误差的影响。为了满足Con-X以外的要求,Gen-X光学器件将比以往更薄,更精确地成形。为了实现这些具有挑战性的目标,我们首次将主动图形控制与掠入射光学系统结合在一起。压电材料将直接在离散的单元中沉积在光学段的背面,且应变方向平行于表面。反射镜两层之间的差异应变会导致两个方向的局部弯曲,从而实现局部图形控制。调整数字在轨情况下的制造和计量。通过降低因发射引起的变形和/或在轨退化引起的风险,更改镜像形状的能力增加了裕度。我们简化了Gen-X要求,以反映出镜像和四个望远镜的设计,并讨论了设计之间的各种交易。

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