NANOIMPRINT TECHNOLOGY: A LOW COST, MASS MANUFACTURE OF NANOSTRUCTURES

摘要

Nanomanufacturing seeks to exploit new opportunities from the manipulation of physical, mechanical, chemical and biological processes at the nano-scale in order to produce new materials with unique properties and new devices with unique functionalities. One nanomanufacturing technology that is receiving attention is nanoimprinting. It involves using a rigid or flexible mold to imprint nano-scale forms into resist-coated materials. After reactive ion etching and lift-off, nanostructures are produced in silicon and other materials. The technique is now capable of producing simple structures, such as periodic gratings and gates. Nanoimprinting is being promoted as a means to break the barrier that optical lithography will face as the demand increases for smaller feature (<100nm) and device sizes. A variant of nanoimprinting is laser-assisted direct imprinting (LADI). It consists of directly imprinting nanostructures in rapidly melted surfaces. This paper will review the requirements for nanomanufacturing, the current status of nanoimprinting and materials-related issues facing techniques such as direct imprinting.