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STM/STS study of SI nano pn junctions under Illumination

机译:照明下SI纳米pn结的STM / STS研究

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摘要

Silicon pn junctions are widely used as the fundamental structures of semiconductor devices. They are also very important both in modern electornic applications and in understanding semiconductor devices. As those devices are getting smaller and smaller in size, it is required to characterize their structures and local electronic properties on a nano scale. We have already visualized and characterized nano pn junctions fabricated by ion implantation on Si(001) surfaces with the use of scanning tunneling microscopy/scanning tunneling spectroscopy (STM/STS) [1,2]. It is possible to distinguish p-type, depleted p-type, and n~+-type regions both from STM topographic images and from tunneling current-bias voltage (I-V) curves. In this paper, we focus on the visualization of electrical properties in Si nano pn junctions in operation, especially under illumination.
机译:硅pn结被广泛用作半导体器件的基本结构。它们在现代电子应用和理解半导体器件中也非常重要。随着这些器件的尺寸越来越小,需要在纳米级上表征其结构和局部电子特性。我们已经使用扫描隧道显微镜/扫描隧道光谱法(STM / STS)[1,2]可视化并表征了通过离子注入Si(001)表面而制造的纳米pn结。可以从STM形貌图和隧穿电流偏置电压(I-V)曲线中区分出p型,耗尽的p型和n〜+型区域。在本文中,我们着重于在操作中,尤其是在照明下,对Si纳米pn结中电性能的可视化。

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