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SHAPE OF THE RESPONSE CURVE IN SEU TESTING

机译:SEU测试中响应曲线的形状

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摘要

An algorithm for predicting the shape of the curve describing the rise in SEU cross section with the LET of the incident particle from charge-collection measurements at a single LET is described. Two tests of the algorithm are given, one on a bipolar SRAM and the other on a CMOS SRAM. Experimental data agrees with the algorithm for both cases. This agreement suggest that the slow rise in the SEU cross section with the LET of the inident particle is due to fluctuations in the charge collected with particles incident at the same LET.
机译:描述了一种算法,该算法可根据单个LET处的电荷收集测量结果来预测描述SEU截面随入射粒子的LET升高的曲线的形状。给出了两种算法测试,一种在双极性SRAM上进行,另一种在CMOS SRAM上进行。两种情况下的实验数据均与该算法一致。该协议表明,入射粒子的LET随着SEU截面的缓慢上升是由于入射到相同LET的粒子所收集的电荷的波动。

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