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Characterization and quality control of semiconductor wafers using time-correlated single photon counting

机译:使用时间相关的单光子计数对半导体晶片进行表征和质量控制

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Depending on the semiconductor material, the luminescence lifetime of semiconductor wafers can vary over a broadrange from microseconds for Si-wafers down to sub-nanoseconds for III/V and II/VI based thin film or organicmaterials. The lifetime of a given wafer sample depends on the free charge carrier dynamics and can therefore beaffected by several parameters. An important example is the influence of bulk or surface defects [1], thus the lifetime is a possible indicator for wafer quality. On dye-sensitized solar cells, lifetime measurements are also useful to characterize the energy transfer process from the sensitizer to the conduction band [2]. We have developed a setup for time-resolved photoluminescence measurements (TRPL) based on pulsed diode lasers and time-correlated single photon counting (TCSPC) with highly sensitive single photon detectors. Depending on the detector type, the instrument response function (IRF) can be as short as 100 ps and the laser pulse rate can be adapted to the luminescence lifetime of the material. The resolvable lifetimes extend from approx. 50 ps up to several hundredmicroseconds. The electronics can also be integrated into a microscope based setup for imaging with a lateral resolution down to the sub-μm range [3] as well as testing the lifetime behaviour at different injection levels. We will show measurement results of the system on an GaAsP-based Quantum Well.© (2012) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
机译:取决于半导体材料,半导体晶片的发光寿命可以在很宽的范围内变化,从用于Si晶片的微秒到用于III / V和II / VI的薄膜或有机材料的亚纳秒。给定晶圆样品的寿命取决于自由载流子动力学,因此可能会受到几个参数的影响。一个重要的例子是整体缺陷或表面缺陷的影响[1],因此寿命是晶片质量的可能指标。在染料敏化太阳能电池上,寿命测量也可用于表征从敏化剂到导带的能量转移过程[2]。我们已经开发了一种基于脉冲二极管激光器和具有高灵敏度单光子探测器的时间相关单光子计数(TCSPC)的时间分辨光致发光测量(TRPL)的设备。根据检测器的类型,仪器响应函数(IRF)可以短至100 ps,并且激光脉冲频率可以适应材料的发光寿命。可解决的寿命从大约50 ps,几百微秒。电子设备也可以集成到基于显微镜的设置中,以横向分辨率低至亚微米范围[3]进行成像,以及测试不同注入水平下的使用寿命。我们将在基于GaAsP的量子阱上显示该系统的测量结果。©(2012)版权所有,美国光电仪器工程师学会(SPIE)。摘要的下载仅允许个人使用。

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