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Hall measurements on low mobility materials and high resistivity materials

机译:低迁移率材料和高电阻率材料的霍尔测量

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The Hall effect is a primary method to measure carrier density, mobility and carrier type in semiconducting materials. Many contemporary semiconductor and electronic materials being developed for green energy, efficient lighting, flexible inexpensive electronics and high power devices are characterized by very low mobilities . For a traditional DC field Hall system, mobilities of less than 10 cm~2/(Vs) become very difficult to measure with magnetic fields on the order of 1 T. This paper examines an AC field Hall measurement methodology that allows one to measure Hall mobilities down to 0.001 cm /(Vs)-lower than possible using traditional DC field Hall measurement techniques. The first section of this paper is a review of the DC method, followed by the introduction of the AC method. AC field measurements of microcrystalline Si and ZnO are presented.
机译:霍尔效应是测量半导体材料中载流子密度,迁移率和载流子类型的主要方法。正在开发用于绿色能源,高效照明,柔性廉价电子产品和高功率设备的许多当代半导体和电子材料的特点是迁移率非常低。对于传统的直流场霍尔系统,在1 T量级的磁场下,小于10 cm〜2 /(Vs)的迁移率变得非常难以测量。本文研究了一种交流场霍尔测量方法,该方法可以测量霍尔与传统的直流场霍尔测量技术相比,其迁移率低至0.001 cm /(Vs)-更低。本文的第一部分回顾了DC方法,然后介绍了AC方法。提出了微晶硅和氧化锌的交流场测量。

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