Development of a novel photoinduced grafting technique for membrane modification

摘要

A major obstacle to further incorporation of membrane processes into industrial operations is the problem of flux decline due to fluling (1). For nonadhesive fulants exhibiting reversibel fouling, backpulsing is an effective technology to reduce fouling (2). For irreversible fouling due to hydrophobicity, surface charge, and other effects, membrane surface modification techniques, such as physical coating, electron beam irradiation-induced grafting, and phot-induced grating, may be used to reduce fouling by changing membrane surface chemistry (3,4,5).