【24h】

High Voltage Schottky Barrier Diodes on P-Type SiC using Metal-Overlap on a Thick Oxide Layer as Edge Termination

机译:P型SiC上的高压肖特基势垒二极管,使用厚氧化物层上的金属重叠作为边缘端接

获取原文
获取原文并翻译 | 示例

摘要

P-type 6H SiC Schottky barrier diodes with good rectifying characteristics upto breakdown voltage as high as 1000V have been successfully fabricated using metal-overlap over a thick oxide layer (approx 6000 A) as edge termination and Al as the barrier metal. The influence of the oxide layer edge termination in improving the reverse breakdown voltage as well as the forward current - voltage characteristics is presented. The terminated Schottky diodes indicate a factor of two higher breakdown voltage and 2-3 times larger forward current densities than those without edge termination. The specific series resistance of the unterminated diodes was approx 228 m OMEGA -cm~2, while that of the terminated diodes was approx 84 m OMEGA -cm~2.
机译:使用厚的氧化层(约6000 A)作为边缘终止层和Al作为阻挡层金属,已经成功地制造了具有良好的整流特性(击穿电压高达1000V)的P型6H SiC肖特基势垒二极管。提出了氧化层边缘终止对改善反向击穿电压以及正向电流-电压特性的影响。端接的肖特基二极管的击穿电压比没有边缘端接的二极管高两倍,正向电流密度高2-3倍。未端接二极管的比串联电阻约为228 m OMEGA -cm〜2,而端接二极管的比串联电阻约为84 m OMEGA -cm〜2。

著录项

相似文献

  • 外文文献
  • 中文文献
  • 专利
获取原文

客服邮箱:kefu@zhangqiaokeyan.com

京公网安备:11010802029741号 ICP备案号:京ICP备15016152号-6 六维联合信息科技 (北京) 有限公司©版权所有
  • 客服微信

  • 服务号